School of Automation, Central South University, Changsha 410083, China.
School of Automation, Central South University, Changsha 410083, China.
ISA Trans. 2023 Mar;134:472-480. doi: 10.1016/j.isatra.2022.08.022. Epub 2022 Aug 30.
As a critical variable in the roasting process, the roasting temperature has a significant influence on operating conditions. Model predictive control (MPC) provides a path to stabilize the roasting temperature. However, process data collected at different periods usually follow different distributions due to the fluctuation of feed composition for the roasting process, result in a model mismatch on online control. For this reason, a transfer predictive control method based on inter-domain mapping learning (IDML-MPC) is proposed. The proposed method first treat historical and online data as two domains. Then, a distribution mapping function from one domain to another domain is learned to make the distribution of the historical data follow that of the online data. Finally, an accurate online prediction model is built, roasting temperature control is achieved by minimizing the cost function with respect to the predicted value and the control input. The effectiveness of the proposed method is demonstrated by comparative experiments based on a numerical example and a simulation platform of the roasting process. Experimental results compared with some state-of-the-art methods show that it is necessary to take into account the distribution differences between historical data and online data when production conditions change. The IDML-MPC improved the control performance for the roasting temperature with an average 56.98% reduction in the root mean square error.
作为烘焙过程中的一个关键变量,烘焙温度对操作条件有重大影响。模型预测控制(MPC)为稳定烘焙温度提供了一种方法。然而,由于烘焙过程的进料成分波动,不同时期收集的过程数据通常遵循不同的分布,导致在线控制中的模型不匹配。为此,提出了一种基于域间映射学习(IDML-MPC)的转移预测控制方法。该方法首先将历史数据和在线数据视为两个域。然后,学习从一个域到另一个域的分布映射函数,以使历史数据的分布遵循在线数据的分布。最后,通过最小化关于预测值和控制输入的代价函数来构建准确的在线预测模型,从而实现烘焙温度控制。基于数值示例和烘焙过程仿真平台的对比实验验证了该方法的有效性。与一些最先进的方法进行的实验结果比较表明,在生产条件发生变化时,考虑历史数据和在线数据之间的分布差异是必要的。IDML-MPC 提高了烘焙温度的控制性能,平均降低了 56.98%的均方根误差。