Liu Shixin, Ding Er-Xiong, Kelly Adam G, Doolan Luke, Gabbett Cian, Kaur Harneet, Munuera Jose, Carey Tian, Garcia James, Coleman Jonathan N
School of Physics, CRANN & AMBER Research Centres, Trinity College Dublin, Dublin 2, Ireland.
Nanoscale. 2022 Nov 3;14(42):15679-15690. doi: 10.1039/d2nr04196k.
Vertically stacked metal-semiconductor-metal heterostructures, based on liquid-processed nanomaterials, hold great potential for various printed electronic applications. Here we describe the fabrication of such devices by spray-coating semiconducting tungsten disulfide (WS) nanosheets onto indium tin oxide (ITO) bottom electrodes, followed by spraying single-walled carbon nanotubes (SWNTs) as the top electrode. Depending on the formulation of the SWNTs ink, we could fabricate either Ohmic or Schottky contacts at the WS/SWNTs interface. Using isopropanol-dispersed SWNTs led to Ohmic contacts and bulk-limited devices, characterized by out-of-plane conductivities of ∼10 S m. However, when aqueous SWNTs inks were used, rectification was observed, due to the formation of a doping-induced Schottky barrier at the WS/SWNTs interface. For thin WS layers, such devices were characterized by a barrier height of ∼0.56 eV. However, increasing the WS film thickness led to increased series resistance, leading to a change-over from electrode-limited to bulk-limited behavior at a transition thickness of ∼2.6 μm. This work demonstrates that Ohmic/Schottky behavior is tunable and lays the foundation for fabricating large-area 2D nanosheet-based solution-deposited devices and stacks.
基于液相处理纳米材料的垂直堆叠金属-半导体-金属异质结构在各种印刷电子应用中具有巨大潜力。在此,我们描述了此类器件的制造过程,即先将半导体二硫化钨(WS)纳米片喷涂到氧化铟锡(ITO)底部电极上,然后喷涂单壁碳纳米管(SWNTs)作为顶部电极。根据SWNTs墨水的配方,我们可以在WS/SWNTs界面处制造欧姆接触或肖特基接触。使用异丙醇分散的SWNTs会形成欧姆接触和体限制型器件,其面外电导率约为10 S m。然而,当使用水性SWNTs墨水时,由于在WS/SWNTs界面处形成了掺杂诱导的肖特基势垒,会观察到整流现象。对于薄的WS层,此类器件的势垒高度约为0.56 eV。然而,增加WS膜的厚度会导致串联电阻增加,从而在约2.6μm的转变厚度处从电极限制行为转变为体限制行为。这项工作表明欧姆/肖特基行为是可调的,并为制造大面积基于二维纳米片的溶液沉积器件和堆叠结构奠定了基础。