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使用电阻抗光谱法分别量化应变对印刷纳米片网络中纳米片和结电阻的影响。

Using Electrical Impedance Spectroscopy to Separately Quantify the Effect of Strain on Nanosheet and Junction Resistance in Printed Nanosheet Networks.

作者信息

Caffrey Eoin, Carey Tian, Doolan Luke, Dawson Anthony, Coleman Emmet, Sofer Zdeněk, Cassidy Oran, Gabbett Cian, Coleman Jonathan N

机构信息

School of Physics, CRANN & AMBER Research Centres, Trinity College Dublin, Dublin 2, Dublin, D02 PN40, Ireland.

Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technická 5, Prague 6, Prague, 166 28, Czech Republic.

出版信息

Small. 2025 Feb;21(5):e2406864. doi: 10.1002/smll.202406864. Epub 2024 Dec 18.

Abstract

Many printed electronic applications require strain-independent electrical properties to ensure deformation-independent performance. Thus, developing printed, flexible devices using 2D and other nanomaterials will require an understanding of the effect of strain on the electrical properties of nano-networks. Here, novel AC electrical techniques are introduced to fully characterize the effect of strain on the resistance of high-mobility printed networks, fabricated from of electrochemically exfoliated MoS nanosheets. These devices are initially characterized using DC piezoresistance measurements and show good cyclability and a linear strain response, consistent with a low gauge factor of G ≈ 3. However, AC impedance spectroscopy measurements, performed as a function of strain, allow the measurement of the effects of strain on both the nanosheets and the inter-nanosheet junctions separately. The junction resistance is found to increase linearly with strain, while the nanosheet resistance remains constant. This response is consistent with strain-induced sliding of the highly-aligned nanosheets past one another, without any strain being transferred to the sheets themselves. The approach allows for the individual estimation of the contributions of dimensional factors (G ≈ 1.4) and material factors (G ≈ 1.9) to the total gauge factor. This novel technique may provide insights into other piezoresistive systems.

摘要

许多印刷电子应用需要与应变无关的电学性能,以确保性能不随变形而变化。因此,使用二维和其他纳米材料开发印刷柔性器件需要了解应变对纳米网络电学性能的影响。在此,引入了新颖的交流电技术,以全面表征应变对由电化学剥离的MoS纳米片制成的高迁移率印刷网络电阻的影响。这些器件最初通过直流压阻测量进行表征,显示出良好的循环性和线性应变响应,与低应变系数G≈3一致。然而,作为应变函数进行的交流阻抗谱测量,能够分别测量应变对纳米片和纳米片间结的影响。发现结电阻随应变线性增加,而纳米片电阻保持不变。这种响应与高度对齐的纳米片彼此之间的应变诱导滑动一致,且没有任何应变传递到片材本身。该方法允许分别估计尺寸因素(G≈1.4)和材料因素(G≈1.9)对总应变系数的贡献。这种新技术可能为其他压阻系统提供见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7ca1/11798361/be786040417b/SMLL-21-2406864-g001.jpg

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