Si Yangyang, Zhang Tianfu, Chen Zuhuang, Zhang Qinghua, Xu Shuai, Lin Ting, Huang Haoliang, Zhou Chao, Chen Shanquan, Liu Suzhen, Dong Yongqi, Liu Chenhan, Tang Yunlong, Lu Yalin, Jin Kuijuan, Guo Er-Jia, Lin Xi
School of Materials Science and Engineering, Harbin Institute of Technology, Shenzhen, Guangdong 518055, China.
Flexible Printed Electronics Technology Center, Harbin Institute of Technology, Shenzhen, Guangdong 518055, China.
ACS Appl Mater Interfaces. 2022 Nov 16;14(45):51096-51104. doi: 10.1021/acsami.2c14291. Epub 2022 Nov 1.
Antiferroelectric PbZrO has attracted renewed interest in recent years because of its unique properties and wide range of potential applications. However, the nature of antiferroelectricity and its evolution with the electric field and temperature remain controversial, mostly due to the difficulty of obtaining high-quality single-crystal samples. The lack of consensus regarding the phase transition in PbZrO is not only important on a fundamental side but also greatly hinders further applications. Herein, high-quality PbZrO epitaxial thin films are successfully fabricated by pulsed laser deposition. The structural and physical properties of the films are systematically studied via a combination of electric property measurements, X-ray diffraction, scanning transmission electron microscopy imaging, and second-harmonic generation studies. Our studies unveil the noncentrosymmetric nature of PbZrO films at room temperature. Moreover, the Curie temperature increased to 270°, ∼40° higher than that in the bulk, and no intermediate ferroelectric phase was observed. Besides, an incipient ferroelectric with relaxor-like behavior above the Curie temperature due to the existence of a local polar cluster in the high-temperature paraelectric phase is experimentally observed for the first time. Our studies provide a better understanding of PbZrO thin films and pave the way for practical applications of antiferroelectric material in modern electronic devices.
反铁电体PbZrO由于其独特的性能和广泛的潜在应用,近年来重新引起了人们的关注。然而,反铁电性的本质及其随电场和温度的演变仍存在争议,主要原因是难以获得高质量的单晶样品。关于PbZrO中相变缺乏共识不仅在基础层面很重要,而且极大地阻碍了进一步的应用。在此,通过脉冲激光沉积成功制备了高质量的PbZrO外延薄膜。通过电学性能测量、X射线衍射、扫描透射电子显微镜成像和二次谐波产生研究相结合的方法,系统地研究了薄膜的结构和物理性能。我们的研究揭示了PbZrO薄膜在室温下的非中心对称性质。此外,居里温度提高到了270°,比体材料中的居里温度高约40°,并且未观察到中间铁电相。此外,首次通过实验观察到,由于高温顺电相中存在局部极性团簇,在居里温度以上出现了具有类弛豫行为的初生态铁电体。我们的研究为更好地理解PbZrO薄膜奠定了基础,并为反铁电材料在现代电子器件中的实际应用铺平了道路。