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基于氧化物界面的二维电子气在硅上的合成。

Synthesis of Oxide Interface-Based Two-Dimensional Electron Gas on Si.

作者信息

Nian Leyan, Li Jiayi, Wang Zhichao, Zhang Tingting, Sun Haoying, Li Yueying, Gao Tianyi, Deng Yu, Nie Yuefeng, Hao Yufeng

机构信息

National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China.

出版信息

ACS Appl Mater Interfaces. 2022 Nov 30;14(47):53442-53449. doi: 10.1021/acsami.2c18934. Epub 2022 Nov 16.

Abstract

Two-dimensional electron gas (2DEG) at the interface of amorphous AlO/SrTiO (aAO/STO) heterostructures has received considerable attention owing to its convenience of fabrication and relatively high mobility. The integration of these 2DEG heterostructures on a silicon wafer is highly desired for electronic applications but remains challanging up to date. Here, conductive aAO/STO heterostructures have been synthesized on a silicon wafer via a growth-and-transfer method. A scanning transmission electron microscopy image shows flat and close contact between STO membranes and a Si wafer. Electron energy loss spectroscopic measurements reveal the interfacial Ti valence state evolution, which identifies the formation of 2D charge carriers confined at the interface of aAO/STO. This work provides a feasible strategy for the integration of 2DEG on a silicon wafer and other desired substrates for potential functional and flexible electronic devices.

摘要

非晶态AlO/SrTiO(aAO/STO)异质结构界面处的二维电子气(2DEG)因其制备方便且迁移率相对较高而备受关注。将这些2DEG异质结构集成到硅片上对于电子应用来说非常有必要,但迄今为止仍然具有挑战性。在这里,通过生长-转移方法在硅片上合成了导电aAO/STO异质结构。扫描透射电子显微镜图像显示了STO膜与硅片之间平整且紧密的接触。电子能量损失谱测量揭示了界面处Ti价态的演变,这确定了在aAO/STO界面处受限的二维电荷载流子的形成。这项工作为将2DEG集成到硅片和其他用于潜在功能和柔性电子器件的理想衬底上提供了一种可行的策略。

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