Yao Zhenxing, Wang Mingquan, Jia Ruibao, Zhao Qinghua, Liu Li, Sun Shaohua
Shandong Province City Water Supply and Drainage Water Quality Monitoring Center, Jinan 250101, China.
Shandong Province City Water Supply and Drainage Water Quality Monitoring Center, Jinan 250101, China.
J Environ Sci (China). 2023 Apr;126:387-395. doi: 10.1016/j.jes.2022.03.040. Epub 2022 Apr 6.
This study examined the effectiveness for degradation of hydrophobic (HPO), transphilic (TPI) and hydrophilic (HPI) fractions of natural organic matter (NOM) during UV/HO, UV/TiO and UV/KSO (UV/PS) advanced oxidation processes (AOPs). The changing characteristics of NOM were evaluated by dissolved organic carbon (DOC), the specific UV absorbance (SUVA), trihalomethanes formation potential (THMFP), organic halogen adsorbable on activated carbon formation potential (AOXFP) and parallel factor analysis of excitation-emission matrices (PARAFAC-EEMs). In the three UV-based AOPs, HPI fraction with low molecular weight and aromaticity was more likely to degradate than HPO and TPI, and the removal efficiency of SUVA for HPO was much higher than TPI and HPI fraction. In terms of the specific THMFP of HPO, TPI and HPI, a reduction was achieved in the UV/HO process, and the higest removal rate even reached to 83%. UV/TiO and UV/PS processes can only decrease the specific THMFP of HPI. The specific AOXFP of HPO, TPI and HPI fractions were all able to be degraded by the three UV-based AOPs, and HPO content is more susceptible to decompose than TPI and HPI content. UV/HO was found to be the most effective treatment for the removal of THMFP and AOXFP under given conditions. C1 (microbial or marine derived humic-like substances), C2 (terrestrially derived humic-like substances) and C3 (tryptophan-like proteins) fluorescent components of HPO fraction were fairly labile across the UV-based AOPs treatment. C3 of each fraction of NOM was the most resistant to degrade upon the UV-based AOPs. Results from this study may provide the prediction about the consequence of UV-based AOPs for the degradation of different fractions of NOM with varied characteristics.
本研究考察了在紫外光/过氧化氢（UV/HO）、紫外光/TiO₂和紫外光/过硫酸钾（UV/PS）高级氧化过程（AOPs）中，天然有机物（NOM）的疏水（HPO）、亲脂（TPI）和亲水（HPI）组分的降解效果。通过溶解有机碳（DOC）、比紫外吸光度（SUVA）、三卤甲烷生成势（THMFP）、活性炭可吸附有机卤生成势（AOXFP）以及激发-发射矩阵平行因子分析（PARAFAC-EEMs）来评估NOM的变化特征。在这三种基于紫外光的AOPs中，低分子量和低芳香性的HPI组分比HPO和TPI更易降解，且HPO的SUVA去除效率远高于TPI和HPI组分。就HPO、TPI和HPI的比THMFP而言，UV/HO过程实现了降低，最高去除率甚至达到83%。UV/TiO₂和UV/PS过程只能降低HPI的比THMFP。HPO、TPI和HPI组分的比AOXFP均能被这三种基于紫外光的AOPs降解，且HPO含量比TPI和HPI含量更易分解。发现在给定条件下，UV/HO是去除THMFP和AOXFP最有效的处理方法。HPO组分的C1（微生物或海洋来源的类腐殖质）、C2（陆地来源的类腐殖质）和C3（类色氨酸蛋白）荧光组分在基于紫外光的AOPs处理中相当不稳定。NOM各组分的C3在基于紫外光的AOPs处理中最难降解。本研究结果可为预测基于紫外光的AOPs对不同特性NOM组分降解的后果提供依据。
