Linghu Yaoyao, Tong Tianyue, Wu Chao
School of Materials Science and Engineering, North University of China, Taiyuan, 030051, China.
Advanced Energy Materials and Systems Institute, North University of China, Taiyuan, 030051, China.
Chemphyschem. 2023 Apr 17;24(8):e202200712. doi: 10.1002/cphc.202200712. Epub 2023 Jan 16.
Cu doped MoSi N monolayer (Cu-MoSi N ) was firstly proposed to analyze adsorption performances of common gas molecules including O , N , CO, NO, NO , CO , SO , H O, NH and CH via density functional theory (DFT) combining with non-equilibrium Green's function (NEGF). The electronic transport calculations indicate that Cu-MoSi N monolayer has high sensitivity for CO, NO, NO and NH molecules. However, only NH molecule adsorbs on the Cu-MoSi N monolayer with moderate strength (-0.55 eV) and desorbs at room temperature (2.36×10 s). Thus, Cu-MoSi N monolayer is demonstrated as a potential NH sensor.
首次提出了铜掺杂的氮化钼硅单层(Cu-MoSiN),通过密度泛函理论(DFT)结合非平衡格林函数(NEGF)来分析包括O、N、CO、NO、NO₂、CO₂、SO₂、H₂O、NH₃和CH₄在内的常见气体分子的吸附性能。电子输运计算表明,Cu-MoSiN单层对CO、NO、NO₂和NH₃分子具有高灵敏度。然而,只有NH₃分子以中等强度(-0.55 eV)吸附在Cu-MoSiN单层上,并在室温下解吸(2.36×10⁻⁶ s)。因此,Cu-MoSiN单层被证明是一种潜在的NH₃传感器。