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等离子体处理对口腔生物膜的影响。

Plasma Treatment Effects on Oral Biofilms.

作者信息

Hong Qing, Dong Xiaoqing, Chen Meng, Sun Hongmin, Hong Liang, Wang Yong, Yu Qingsong

机构信息

Department of Mechanical and Aerospace Engineering, University of Missouri, Columbia, Missouri, USA.

Nanova, Inc., Columbia, Missouri, USA.

出版信息

Dent Oral Biol Craniofacial Res. 2021;4(2). doi: 10.31487/j.dobcr.2021.02.05. Epub 2021 Jun 1.

Abstract

The objective of this study is to evaluate the plasma treatment effects on oral fungal biofilms. biofilms were developed on the 48-well plate to serve as a model of oral fungal biofilm. The treatment of 0.2% chlorhexidine digluconate (CHX) was used as a positive control compared with plasma treatments. The efficacy of treatments was determined by 3-(4,5-dimethylazol-2-yl)-2,5-diphenyl-2H-tetrazolium bromide (MTT) assay and confocal laser scanning microscope (CLSM). The survival percentage of decreased from 52% to 27% as the plasma power increased from 6mA to 8mA and plasma exposure time extended from 2 min to 10 min. Moreover, it was found that there is a synergistic effect of the combination of plasma and CHX treatments. Scanning electron microscopy (SEM) examination indicated severe cell damages resulting from plasma treatment. In conclusion, the low-temperature plasma treatment is effective in deactivating biofilms and thus provides a promising alternative to disinfect oral fungal biofilms.

摘要

本研究的目的是评估等离子体处理对口腔真菌生物膜的影响。在48孔板上形成生物膜,作为口腔真菌生物膜的模型。与等离子体处理相比,使用0.2%葡萄糖酸氯己定(CHX)处理作为阳性对照。通过3-(4,5-二甲基唑-2-基)-2,5-二苯基-2H-溴化四氮唑(MTT)测定法和共聚焦激光扫描显微镜(CLSM)确定处理的效果。随着等离子体功率从6mA增加到8mA且等离子体暴露时间从2分钟延长到10分钟,存活率从52%降至27%。此外,发现等离子体和CHX处理联合具有协同作用。扫描电子显微镜(SEM)检查表明等离子体处理导致严重的细胞损伤。总之,低温等离子体处理在使生物膜失活方面有效,因此为消毒口腔真菌生物膜提供了一种有前景的替代方法。

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