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在全氟萘烷液体中用元素氟处理的PVTMS薄膜的表面和结构表征

Surface and Structural Characterization of PVTMS Films Treated by Elemental Fluorine in Liquid Perfluorodecalin.

作者信息

Belov Nikolay A, Alentiev Aleksandr Y, Pashkevich Dmitrii S, Voroshilov Fedor A, Dvilis Edgar S, Asanov Igor P, Nikiforov Roman Y, Chirkov Sergey V, Syrtsova Daria A, Kostina Julia V, Bogdanova Yulia G

机构信息

Tomsk Polytechnic University, 30, Lenin Avenue, 634050 Tomsk, Russia.

A.V. Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, 29, Leninskii Prospect, 119991 Moscow, Russia.

出版信息

Materials (Basel). 2023 Jan 18;16(3):913. doi: 10.3390/ma16030913.

Abstract

Poly(vinyl trimethylsilane) (PVTMS) films were subjected to direct surface fluorination in liquid medium (perfluorodecalin). The samples were investigated using several techniques: SEM-XEDS, XPS, ATR-IR, and contact angle measurement. The methods used allowed us to estimate chemical changes occurring because of the treatment. ATR-IR showed that most of the changes occurred in the Si(CH) group. Monofluorinated Si(CH) groups formed in the near-surface layer (Ge crystal, 0.66 µm penetration) after 30 min of fluorination, and then di- and trifluorinated groups appeared. Oxidation of the film with oxygen was also shown with the use of ZnSe crystal (2 µm penetration). The XPS method allowed an assessment of the ratio of the main elements at the surface of the fluorinated film. Two different exponential models were proposed to fit the experimental data of SEM-XEDS. Based on the model with the intercept, the depth of fluorination was estimated to be ≤1.1 µm, which is consistent with the result from the literature for the gas-phase fluorination. Contact angle measurements showed that oxidation of the PVTMS surface prevailed for the first 45 min of fluorination (surface hydrophilization) with a subsequent fluorine content increase and hydrophobization of the surface upon 60 min of fluorination.

摘要

聚(乙烯基三甲基硅烷)(PVTMS)薄膜在液体介质(全氟萘烷)中进行直接表面氟化处理。使用多种技术对样品进行了研究:扫描电子显微镜-能量散射X射线光谱(SEM-XEDS)、X射线光电子能谱(XPS)、衰减全反射红外光谱(ATR-IR)和接触角测量。所采用的方法使我们能够评估由于处理而发生的化学变化。ATR-IR表明,大多数变化发生在Si(CH)基团中。氟化30分钟后,在近表面层(锗晶体,穿透深度0.66 µm)形成了单氟化Si(CH)基团,然后出现了二氟化和三氟化基团。使用硒化锌晶体(穿透深度2 µm)也显示了薄膜的氧化情况。XPS方法可以评估氟化薄膜表面主要元素的比例。提出了两种不同的指数模型来拟合SEM-XEDS的实验数据。基于有截距的模型,估计氟化深度≤1.1 µm,这与气相氟化的文献结果一致。接触角测量表明,在氟化的前45分钟,PVTMS表面的氧化占主导(表面亲水化),随后氟含量增加,氟化60分钟后表面疏水化。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4aec/9917527/b3ec88085e77/materials-16-00913-g001.jpg

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