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通过直接硒化法在晶圆级上合成二维 WSe 层,用于高灵敏度范德瓦尔斯异质结宽带光探测器。

Wafer-Scale Patterning Synthesis of Two-Dimensional WSe Layers by Direct Selenization for Highly Sensitive van der Waals Heterojunction Broadband Photodetectors.

机构信息

School of Physics and Microelectronics, and Key Laboratory of Material Physics, Ministry of Education, Zhengzhou University, Zhengzhou, Henan 450052, China.

Department of Electrical and Computer Engineering, University of California San Diego, La Jolla, California 92093, United States.

出版信息

ACS Appl Mater Interfaces. 2023 Mar 8;15(9):12052-12060. doi: 10.1021/acsami.2c22409. Epub 2023 Feb 27.

Abstract

Two-dimensional (2D) transition-metal dichalcogenides (TMDs) exhibit promising potential in fabricating highly sensitive photodetectors due to their unique electrical and optoelectrical characteristics. However, micron-sized 2D materials produced by conventional chemical vapor deposition (CVD) and mechanical exfoliation methods fail to satisfy the demands for applications in integrated optoelectronics and systems given their poor controllability and repeatability. Here, we propose a simple selenization approach to grow wafer-scale (2 in.) 2D -WSe layers with high uniformity and customized patterns. Furthermore, a self-driven broadband photodetector with a -WSe/-Si van der Waals heterojunction has been fabricated with a satisfactory responsivity of 689.8 mA/W and a large specific detectivity of 1.59 × 10 Jones covering from ultraviolet to short-wave infrared. In addition, a remarkable nanosecond response speed has been recorded under 0.5% duty cycle of the input light. The proposed selenization approach on the growth of 2D WSe layers demonstrates an effective route to fabricate highly sensitive broadband photodetectors used for integrated optoelectronic systems.

摘要

二维(2D)过渡金属二卤族化合物(TMDs)由于其独特的电学和光电特性,在制造高灵敏度光探测器方面表现出了有前景的潜力。然而,传统的化学气相沉积(CVD)和机械剥离方法所产生的微米级 2D 材料,由于其可控性和重复性较差,无法满足集成光电和系统应用的需求。在这里,我们提出了一种简单的硒化方法,用于生长具有高均匀性和定制图案的晶圆级(2 英寸)2D-WSe 层。此外,我们已经制备了一个具有自驱动功能的宽带光探测器,其 -WSe/-Si 范德华异质结具有令人满意的响应率 689.8 mA/W 和大的特定探测率 1.59×10 琼斯,涵盖了从紫外到短波红外的范围。此外,在输入光的 0.5%占空比下,记录到了显著的纳秒响应速度。所提出的在 2D WSe 层上生长的硒化方法,为用于集成光电系统的高灵敏度宽带光探测器的制造提供了一条有效途径。

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