Zhang Jianbin, Shang Conghui, Dai Xinyue, Zhang Yao, Zhu Tao, Zhou Nan, Xu Hua, Yang Rusen, Li Xiaobo
Shaanxi Joint Key Laboratory of Graphene, School of Advanced Materials and Nanotechnology, Xidian University, Xi'an 710126, P. R. China.
Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education, Shaanxi Key Laboratory for Advanced Energy Devices, Shaanxi Engineering Lab for Advanced Energy Technology, School of Materials Science and Engineering, Shaanxi Normal University, Xi'an 710119, P. R. China.
ACS Appl Mater Interfaces. 2023 Mar 15;15(10):13281-13289. doi: 10.1021/acsami.2c20030. Epub 2023 Mar 1.
Germanium arsenic (GeAs) as a promising two-dimensional (2D) semiconducting material has attracted extensive attention. The high carrier mobility and tunable bandgap of GeAs offer broad prospects in electronic and optoelectronic device-related applications. The unique intrinsic anisotropy arising from the low-symmetry structure can be applied in the design of new devices. However, the rapid degradation of mechanically exfoliated GeAs in the environment poses a challenge to its practical development in scalable devices. Here, an approach to stabilize the sensitive material without isolation from the ambient environment is reported. The graphene capping layer effectively suppresses environmental degradation, enabling the encapsulated GeAs photodetectors to maintain the key electronic properties for more than 3 months under ambient conditions. In addition, the regulation of the work function of graphene significantly improves the device performance. An improved responsivity of 965.07 A/W is 20 times higher than that of pure GeAs. This work provides opportunities for the practical application of GeAs and other environmentally sensitive 2D materials.
锗砷(GeAs)作为一种有前景的二维(2D)半导体材料,已引起广泛关注。GeAs的高载流子迁移率和可调节带隙在电子和光电器件相关应用中具有广阔前景。由低对称结构产生的独特本征各向异性可应用于新器件设计。然而,机械剥离的GeAs在环境中快速降解,这对其在可扩展器件中的实际发展构成挑战。在此,报道了一种在不与环境隔离的情况下稳定这种敏感材料的方法。石墨烯覆盖层有效抑制了环境降解,使封装的GeAs光电探测器在环境条件下能够在3个多月的时间内保持关键电子性能。此外,对石墨烯功函数的调节显著提高了器件性能。965.07 A/W的改进响应率比纯GeAs高20倍。这项工作为GeAs和其他对环境敏感的二维材料的实际应用提供了机会。