Department of Chemical Engineering, Indian Institute of Technology Kharagpur, Kharagpur 721302, India.
Langmuir. 2023 Apr 4;39(13):4789-4798. doi: 10.1021/acs.langmuir.3c00167. Epub 2023 Mar 20.
Dynamic wetting by liquids on solid surfaces depends on several aspects such as surface energy, roughness, and interfacial tension, among many others. Copper (Cu), gold (Au), aluminum (Al), and silicon (Si) are a few of the most important metals that are used extensively as substrates in various industrial and biomedical applications. Metals are etched frequently on different crystal planes for fabrication purposes. Etching exposes distinct crystal planes that may come in contact with the liquids when used for different applications. The interaction of the crystal planes with the liquid that comes in contact with the solid dictates the wetting behavior of the surface. This necessitates the importance of understanding how various crystal planes of the same metals behave under similar conditions. Herein, three specific crystal planes, namely, (1 0 0), (1 1 0), and (1 1 1), are investigated at a molecular scale for the above-mentioned metals. The dynamic contact angle and contact diameter trends revealed that the relatively hydrophobic surfaces (Cu, Si) tend to reach their equilibrium contact angle faster compared to the hydrophilic substrates (Al, Au). Molecular kinetic theory is used to estimate the three-phase contact line friction which is found to be higher for (1 1 1) planes. Further, a consistent potential energy distribution variation is observed for the crystal lattice of (1 0 0), (1 1 0), and (1 1 1). These findings can be used as a guideline to determine the factors needed to completely describe a dynamic wetting phenomenon of the droplet over the different crystal planes. The understanding will be of great use in deciding experimental strategies where fabricated different crystal planes would be required to have a liquid contact.
液体在固体表面的动态润湿取决于几个方面,例如表面能、粗糙度和界面张力等。铜 (Cu)、金 (Au)、铝 (Al) 和硅 (Si) 是一些最重要的金属,它们被广泛用作各种工业和生物医学应用的基底。为了制造目的,金属经常在不同的晶面上进行蚀刻。蚀刻暴露了不同的晶面,这些晶面在用于不同应用时可能会与液体接触。当与固体接触的液体与晶面相互作用时,就决定了表面的润湿行为。这就需要了解相同金属的不同晶面在相似条件下的行为。在此,针对上述金属研究了三个特定的晶面,即 (100)、(110) 和 (111)。在分子尺度上研究了动态接触角和接触直径趋势表明,相对疏水性表面 (Cu、Si) 比亲水性基底 (Al、Au) 更快地达到其平衡接触角。分子动力学理论用于估计三相接触线摩擦力,发现 (111) 面的摩擦力较高。此外,还观察到晶格的势能分布变化一致,包括 (100)、(110) 和 (111) 晶面。这些发现可以作为确定完全描述不同晶面上液滴动态润湿现象所需因素的指南。这些理解对于决定需要制造不同晶面以实现液体接触的实验策略非常有用。