Esmaeilzadeh Khabazi Marzieh, Najafi Chermahini Alireza
Department of Chemistry, Isfahan University of Technology (IUT), Isfahan 8415683111, Iran.
ACS Omega. 2023 Mar 8;8(11):9978-9994. doi: 10.1021/acsomega.2c07185. eCollection 2023 Mar 21.
Corrosion is one of the problems that most industries face. Our aim in the current study is to perform density functional theory calculations and Monte Carlo simulation to theoretically investigate the corrosion inhibition of the copper (1 1 1) surface by tetrazole molecules and a group of their derivatives. These compounds have electron-donating groups (CH, CHO, and OH) and electron-withdrawing groups (F, CN, and NO). Two different isomeric forms of tetrazole molecules and their derivatives, including 1 and 2 tautomers, were studied in two configurations, parallel and perpendicular to the Cu (1 1 1) surface. With the help of DMol3 calculations, the most important parameters related to the molecular ability of tetrazole derivatives as corrosion inhibitors include the adsorption energy (Δ), , , , and issues related to chemical reactions, including total hardness (η), electronegativity (χ), and electron fraction transitions from the anti-corrosion molecule to the copper atom (Δ), were calculated and compared in the tetrazole molecules and their derivatives. Also, with the help of adsorption locator calculations, the inhibitory effects of these compounds were theoretically investigated in an acidic environment. Through these calculations, it was determined that tetrazole molecules with electron-donating groups adsorbed perpendicularly to the copper (1 1 1) surface, by forming a stronger bond, are considered suitable corrosion inhibitors. Also, among the examined molecules, the 2-tetrazole isomer form plays a more influential role than the 1-tetrazole form.
腐蚀是大多数行业面临的问题之一。我们在当前研究中的目的是进行密度泛函理论计算和蒙特卡罗模拟,从理论上研究四唑分子及其一组衍生物对铜(1 1 1)表面的缓蚀作用。这些化合物含有供电子基团(CH、CHO和OH)和吸电子基团(F、CN和NO)。研究了四唑分子及其衍生物的两种不同异构体形式,包括1和2互变异构体,以平行和垂直于Cu(1 1 1)表面的两种构型进行研究。借助DMol3计算,与四唑衍生物作为缓蚀剂的分子能力相关的最重要参数包括吸附能(Δ)、 、 、 ,以及与化学反应相关的问题,包括总硬度(η)、电负性(χ)和从防腐分子到铜原子的电子分数跃迁(Δ),在四唑分子及其衍生物中进行了计算和比较。此外,借助吸附定位计算,在酸性环境中从理论上研究了这些化合物的抑制作用。通过这些计算,确定了带有供电子基团的四唑分子通过形成更强的键垂直吸附在铜(1 1 1)表面,被认为是合适的缓蚀剂。此外,在所研究的分子中,2-四唑异构体形式比1-四唑形式发挥更有影响力的作用。