Chen Runlin, Gong Yufeng, Xie Maoliang, Rao Cheng, Zhou Lan, Pang Yuxia, Lou Hongming, Yang Dongjie, Qiu Xueqing
School of Chemistry and Chemical Engineering, Guangdong Provincial Key Lab of Green Chemical Product Technology, State Key Laboratory of Pulp and Paper Engineering, South China University of Technology, Guangzhou 510640, China.
School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, China.
Langmuir. 2023 Apr 11;39(14):5065-5077. doi: 10.1021/acs.langmuir.3c00051. Epub 2023 Mar 27.
The introduction of metal vacancies into n-type semiconductors could efficiently construct intimate contact interface p-n homojunctions to accelerate the separation of photogenerated carriers. In this work, a cationic surfactant occupancy method was developed to synthesize an indium-vacancy ()-enriched p-n amorphous/crystal homojunction of indium sulfide (A/C-IS) for sodium lignosulfonate (SL) degradation. The amount of in the A/C-IS could be regulated by varying the content of added cetyltrimethylammonium bromide (CTAB). Meanwhile, the steric hindrance of CTAB produced mesopores and macropores, providing transfer channels for SL. The degradation rates of A/C-IS to SL were 8.3 and 20.9 times higher than those of crystalline InS and commercial photocatalyst (P25), respectively. The presence of unsaturated dangling bonds formed by reduced the formation energy of superoxide radicals (O). In addition, the inner electric field between the intimate contact interface p-n A/C-IS promoted the migration of electron-hole pairs. A reasonable degradation pathway of SL by A/C-IS was proposed based on the above mechanism. Moreover, the proposed method could also be applicable for the preparation of p-n homojunctions with metal vacancies from other sulfides.
将金属空位引入n型半导体可以有效地构建紧密接触界面的p-n同质结,以加速光生载流子的分离。在这项工作中,开发了一种阳离子表面活性剂占据法,用于合成富含铟空位()的硫化铟p-n非晶/晶体同质结(A/C-IS),用于降解木质素磺酸钠(SL)。A/C-IS中的含量可以通过改变添加的十六烷基三甲基溴化铵(CTAB)的含量来调节。同时,CTAB的空间位阻产生了中孔和大孔,为SL提供了传输通道。A/C-IS对SL的降解率分别比结晶InS和商业光催化剂(P25)高8.3倍和20.9倍。由形成的不饱和悬空键的存在降低了超氧自由基(O)的形成能。此外,紧密接触界面p-n A/C-IS之间的内电场促进了电子-空穴对的迁移。基于上述机理,提出了A/C-IS降解SL的合理途径。此外,所提出的方法也可适用于制备其他硫化物的具有金属空位的p-n同质结。