Fabulas Laboratory, Department of Engineering Physics, Polytechnique Montreal, 2900 Blvd Edouard-Montpetit, Montreal, H3T 1J4, Canada.
Centre d'Optique, Photonique et Laser, Université Laval, 2375 Rue de la Terrasse, Québec, QC, G1V 0A6, Canada.
Sci Rep. 2023 Apr 3;13(1):5436. doi: 10.1038/s41598-023-31912-1.
We demonstrate laser induced cooling in ytterbium doped silica (SiO) glass with alumina, yttria co-doping (GAYY-Aluminum: Yttrium: Ytterbium Glass) fabricated using the modified chemical vapour deposition (MCVD) technique. A maximum temperature reduction by - 0.9 K from room temperature (296 K) at atmospheric pressure was achieved using only 6.5 W of 1029 nm laser radiation. The developed fabrication process allows us to incorporate ytterbium at concentration of 4 × 10 ions/m which is the highest value reported for laser cooling without clustering or lifetime shortening, as well as to reach a very low background absorptive loss of 10 dB/km. The numerical simulation of temperature change versus pump power well agrees with the observation and predicts, for the same conditions, a temperature reduction of 4 K from room temperature in a vacuum. This novel silica glass has a high potential for a vast number of applications in laser cooling such as radiation-balanced amplifiers and high-power lasers including fiber lasers.
我们展示了掺镱二氧化硅（SiO）玻璃中激光诱导冷却，该玻璃采用改良化学气相沉积（MCVD）技术，掺有氧化铝和氧化钇（GAYY-铝：钇：镱玻璃）。在大气压力下，仅使用 6.5W 的 1029nm 激光辐射，就可将室温（296K）降低-0.9K。所开发的制造工艺允许我们将浓度为 4×10 离子/m 的镱掺入其中，这是在不发生团聚或寿命缩短的情况下进行激光冷却所报道的最高值，并且能够达到非常低的背景吸收损耗 10dB/km。温度变化对泵浦功率的数值模拟与观察结果非常吻合，并预测在相同条件下，真空环境中室温下的温度降低 4K。这种新型二氧化硅玻璃在激光冷却的大量应用中具有很高的潜力，例如辐射平衡放大器和高功率激光器，包括光纤激光器。
