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使用代谢抑制剂来比较暴露于254纳米和大于310纳米太阳灯产生的紫外线辐射下的人类皮肤成纤维细胞中嘧啶二聚体和非二聚体DNA损伤的切除修复情况。

The use of metabolic inhibitors to compare the excision repair of pyrimidine dimers and nondimer DNA damages in human skin fibroblasts exposed to 254-nm and sunlamp-produced greater than 310-nm ultraviolet radiation.

作者信息

Rosenstein B S, Chao C C, Ducore J M

出版信息

Environ Mutagen. 1986;8(3):335-43. doi: 10.1002/em.2860080303.

Abstract

Normal human skin fibroblasts were exposed to either 0-5 J/m2 of 254-nm ultraviolet (UV) radiation or 0-50 kJ/m2 of the Mylar-filtered UV (greater than 310 nm) produced by a fluorescent sunlamp. These cells were then incubated for 0-20 min in medium containing 10 mM hydroxyurea (HU) and 0.1 mM 1-beta-D-arabinofuranosyl cytosine (ara C), and the yield of DNA strand breaks was measured by means of the alkaline elution technique. For cells irradiated with 254-nm UV, which results primarily in the formation of cyclobutane pyrimidine dimers, a rapid increase in DNA strand breaks was detected following incubation with these metabolic inhibitors. In contrast, only a low level of strand breaks formed in cells incubated with HU and ara C after irradiation with approximately equitoxic fluences of sunlamp UV greater than 310 nm, which mainly causes the induction of nondimer DNA lesions. Hence, these results are consistent with the conclusion that the pathways involved in the repair of nondimer DNA damages induced by UV wavelengths greater than 310 nm differ from the repair of pyrimidine dimers.

摘要

将正常人皮肤成纤维细胞暴露于0 - 5 J/m²的254纳米紫外线(UV)辐射或0 - 50 kJ/m²由荧光太阳灯产生的聚酯薄膜过滤紫外线(大于310纳米)下。然后将这些细胞在含有10 mM羟基脲(HU)和0.1 mM 1-β-D-阿拉伯呋喃糖基胞嘧啶(ara C)的培养基中孵育0 - 20分钟,并用碱性洗脱技术测量DNA链断裂的产量。对于用254纳米紫外线照射的细胞,其主要导致环丁烷嘧啶二聚体的形成,在用这些代谢抑制剂孵育后检测到DNA链断裂迅速增加。相比之下,在用大于310纳米的太阳灯紫外线近似等毒性剂量照射后,用HU和ara C孵育的细胞中仅形成低水平的链断裂,这种紫外线主要导致非二聚体DNA损伤的诱导。因此,这些结果与以下结论一致,即大于310纳米的紫外线波长诱导的非二聚体DNA损伤的修复途径不同于嘧啶二聚体的修复途径。

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