Department of Physics and Engineering Physics, Yonsei University, 1 Yonseidae-gil, Wonju-si 26493, Republic of Korea.
Department of Physics, Boston University, 590 Commonwealth Avenue, Boston, MA 02215, USA.
Molecules. 2023 Apr 29;28(9):3821. doi: 10.3390/molecules28093821.
Efficient energy-level alignment is crucial for achieving high performance in organic electronic devices. Because the electronic structure of an organic semiconductor is significantly influenced by its molecular orientation, comprehensively understanding the molecular orientation and electronic structure of the organic layer is essential. In this study, we investigated the interface between a 1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile (HAT-CN) hole injection layer and a zinc-phthalocyanine (ZnPc) p-type organic semiconductor. To determine the energy-level alignment and molecular orientation, we conducted in situ ultraviolet and X-ray photoelectron spectroscopies, as well as angle-resolved X-ray absorption spectroscopy. We found that the HAT-CN molecules were oriented relatively face-on (40°) in the thin (5 nm) layer, whereas they were oriented relatively edge-on (62°) in the thick (100 nm) layer. By contrast, ZnPc orientation was not significantly altered by the underlying HAT-CN orientation. The highest occupied molecular orbital (HOMO) level of ZnPc was closer to the Fermi level on the 100 nm thick HAT-CN layer than on the 5 nm thick HAT-CN layer because of the higher work function. Consequently, a considerably low energy gap between the lowest unoccupied molecular orbital level of HAT-CN and the HOMO level of ZnPc was formed in the 100 nm thick HAT-CN case. This may improve the hole injection ability of the anode system, which can be utilized in various electronic devices.
有效的能级对准对于实现有机电子器件的高性能至关重要。由于有机半导体的电子结构受到其分子取向的显著影响,因此全面了解有机层的分子取向和电子结构至关重要。在这项研究中,我们研究了 1,4,5,8,9,11-六氮杂三苯六碳腈(HAT-CN)空穴注入层与锌酞菁(ZnPc)p 型有机半导体之间的界面。为了确定能级对准和分子取向,我们进行了原位紫外光和 X 射线光电子能谱以及角分辨 X 射线吸收光谱测量。我们发现,在较薄(5nm)的层中,HAT-CN 分子的取向相对面内(40°),而在较厚(100nm)的层中,它们的取向相对边缘(62°)。相比之下,ZnPc 的取向不受底层 HAT-CN 取向的显著影响。由于功函数较高,在较厚的 100nm HAT-CN 层上,ZnPc 的最高占据分子轨道(HOMO)能级更接近费米能级。因此,在较厚的 100nm HAT-CN 情况下,HAT-CN 的最低未占据分子轨道能级和 ZnPc 的 HOMO 能级之间形成了相当低的能隙。这可能会提高阳极系统的空穴注入能力,从而可应用于各种电子设备。