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通过常压软 X 射线吸收光谱研究高温水/氯化镁界面。

Investigating the High-Temperature Water/MgCl Interface through Ambient Pressure Soft X-ray Absorption Spectroscopy.

机构信息

Dipartimento di Chimica, Università di Roma "La Sapienza", P.le A. Moro 5, 00185 Roma, Italy.

Istituto per la Sintesi Organica e la Fotoreattività (ISOF), Consiglio Nazionale delle Ricerche (CNR), via P. Gobetti 101, 40129 Bologna, Italy.

出版信息

ACS Appl Mater Interfaces. 2023 May 31;15(21):26166-26174. doi: 10.1021/acsami.3c02985. Epub 2023 May 18.

Abstract

Magnesium chloride is a prototypical deliquescent material whose surface properties, although central for Ziegler-Natta cataysis, have so far remained elusive to experimental characterization. In this work, we use surface-selective X-ray absorption spectroscopy (XAS) at ambient pressure in combination with multivariate curve resolution, molecular dynamics, and XAS theoretical methods to track in real time and accurately describe the interaction between water vapor and the MgCl surface. By exposing MgCl to water vapor at temperatures between 595 and 391 K, we show that water is preferentially adsorbed on five-coordinated Mg sites in an octahedral configuration, confirming previous theoretical predictions, and find that MgCl is capable of retaining a significant amount of adsorbed water even under prolonged heating to 595 K. As a consequence, our work provides first experimental insights into the unique surface affinity of MgCl for atmospheric water. The developed technique is proven highly sensitive to the modifications induced by adsorbates on a given low-Z metal based surface and may be useful in the toolbox required to disentangle the mechanisms of interfacial chemical processes.

摘要

氯化镁是一种典型的潮解材料,其表面性质对 Ziegler-Natta 催化至关重要,但迄今为止,其表面性质仍难以通过实验进行表征。在这项工作中,我们使用常压下的表面选择 X 射线吸收光谱 (XAS) 结合多元曲线分辨、分子动力学和 XAS 理论方法,实时跟踪并准确描述水蒸气与 MgCl 表面的相互作用。通过在 595 至 391 K 之间将 MgCl 暴露于水蒸气中,我们证明水蒸气优先吸附在具有八面体构型的五配位 Mg 位上,这证实了先前的理论预测,并发现即使在延长加热至 595 K 的情况下,MgCl 仍能够保留相当数量的吸附水。因此,我们的工作首次提供了有关 MgCl 对大气水独特表面亲和力的实验见解。所开发的技术对给定的低 Z 金属基表面上吸附物引起的修饰具有高度敏感性,并且可能有助于解开界面化学过程的机制所需的工具包中有用。

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