Fang Liping, Chi Jialin, Shi Qiantao, Wu Yundang, Li Fangbai
National-Regional Joint Engineering Research Center for Soil Pollution Control and Remediation in South China, Guangdong Key Laboratory of Integrated Agro-environmental Pollution Control and Management, Institute of Eco-environmental and Soil Sciences, Guangdong Academy of Sciences, Guangzhou 510650, China.
Center for Environmental Systems, Stevens Institute of Technology, Hoboken, NJ 07030, United States.
Water Res. 2023 Aug 15;242:120180. doi: 10.1016/j.watres.2023.120180. Epub 2023 Jun 9.
The interfacial electron transfer (ET) between electron shuttling compounds and iron (Fe) oxyhydroxides plays a crucial role in the reductive dissolution of Fe minerals and the fate of surface-bound arsenic (As). However, the impact of exposed facets of highly crystalline hematite on reductive dissolution and As immobilization is poorly understood. In this study, we systematically investigated the interfacial processes of the electron shuttling compound cysteine (Cys) on various facets of hematite and the reallocations of surface-bound As(III) or As(V) on the respective surfaces. Our results demonstrate that the ET process between Cys and hematite generates Fe(II) and leads to reductive dissolution, with more Fe(II) generated on {001} facets of exposed hematite nanoplates (HNPs). Reductive dissolution of hematite leads to significantly enhanced As(V) reallocations on hematite. Nevertheless, upon the addition of Cys, a raipd release of As(III) can be halted by its prompt re-adsorption, leaving the extent of As(III) immobilization on hematite unchanged throughout the course of reductive dissolution. This is due to that Fe(II) can form new precipitates with As(V), a process that is facet-dependent and influenced by water chemistry. Electrochemical analysis reveals that HNPs exhibit higher conductivity and ET ability, which is beneficial for reductive dissolution and As reallocations on hematite. These findings highlight the facet-dependent reallocations of As(III) and As(V) facilitated by electron shuttling compounds and have implications for the biogeochemical processes of As in soil and subsurface environments.
电子穿梭化合物与氢氧化铁之间的界面电子转移(ET)在铁矿物的还原溶解以及表面结合砷(As)的归宿中起着关键作用。然而,高度结晶的赤铁矿暴露晶面对还原溶解和砷固定的影响却鲜为人知。在本研究中,我们系统地研究了电子穿梭化合物半胱氨酸(Cys)在赤铁矿各晶面上的界面过程以及表面结合的As(III)或As(V)在相应表面上的重新分配。我们的结果表明,Cys与赤铁矿之间的ET过程产生Fe(II)并导致还原溶解,在暴露的赤铁矿纳米片(HNPs)的{001}晶面上产生更多的Fe(II)。赤铁矿的还原溶解导致赤铁矿上As(V)的重新分配显著增强。然而,加入Cys后,As(III)的快速释放可通过其迅速重新吸附而停止,在还原溶解过程中,赤铁矿上As(III)的固定程度保持不变。这是因为Fe(II)可以与As(V)形成新的沉淀物,这一过程依赖于晶面并受水化学影响。电化学分析表明,HNPs表现出更高的导电性和ET能力,这有利于赤铁矿上的还原溶解和As的重新分配。这些发现突出了电子穿梭化合物促进的As(III)和As(V)的晶面依赖性重新分配,并对土壤和地下环境中As的生物地球化学过程具有启示意义。