Zhu Min, Sheng Zongqiang, Gao Juan, Li Yang, Zhang Chao, Zhu Xuebin
School of Mechanics and Optoelectronic Physics, Anhui University of Science and Technology, Huainan 232001, China.
School of Chemistry and Materials Science, University of Science and Technology of China, Hefei 230026, China.
Dalton Trans. 2023 Jul 25;52(29):9903-9907. doi: 10.1039/d3dt01645e.
Herein, a facile chemical solution deposition (CSD) strategy is adopted to synthesize LaNiO (LNO) thin films with an obvious porous structure (P-LNO). It is demonstrated that the porous structure can greatly promote the OER performance of LNO, requiring an overpotential of 367 mV to achieve 10 mA cm, which is much lower than that of a normal LNO thin film (478 mV). As revealed by the following experimental results, the presence of the porous structure offers more exposed active sites and promotes electron transfer between catalysts and electrolyte, giving rise to an enhanced OER performance of the P-LNO film.
在此,采用一种简便的化学溶液沉积(CSD)策略来合成具有明显多孔结构的LaNiO(LNO)薄膜(P-LNO)。结果表明,多孔结构能够极大地提升LNO的析氧反应(OER)性能,达到10 mA cm时所需的过电位为367 mV,这远低于普通LNO薄膜(478 mV)的过电位。如下实验结果所示,多孔结构的存在提供了更多暴露的活性位点,并促进了催化剂与电解质之间的电子转移,从而使P-LNO薄膜的OER性能得到增强。