Li Qingyun, Zhu Houbin, Zhang Honghu, Hu Hui
Opt Express. 2023 Jul 17;31(15):24203-24212. doi: 10.1364/OE.494532.
The interleaver was one of the key devices in dense wavelength division multiplexing (DWDM) applications. In this study, an interleaver with an asymmetrical Mach-Zehnder interferometer structure was designed, fabricated, and characterized in hybrid silicon and lithium niobate thin films (Si-LNOI). The interleaver based on Si-LNOI could be fabricated by mature processing technology of Si photonic, and it was capable of the electro-optical (E-O) tuning function by using the E-O effect of LN. In the range of 1530-1620 nm, the interleaver achieved a channel spacing of 55 GHz and an extinction ratio of 12-28 dB. Due to the large refractive index of Si, the Si loading strip waveguide based on Si-LNOI had a compact optical mode area, which allowed a small electrode gap to improve the E-O modulation efficiency of the interleaver. For an E-O interaction length of 1 mm, the E-O modulation efficiency was 26 pm/V. The interleaver will have potential applications in DWDM systems, optical switches, and filters.
交织器是密集波分复用（DWDM）应用中的关键器件之一。在本研究中，设计、制造并表征了一种具有非对称马赫曾德尔干涉仪结构的交织器，该交织器采用混合硅和铌酸锂薄膜（Si-LNOI）。基于Si-LNOI的交织器可通过成熟的硅光子加工技术制造，并且利用铌酸锂的电光（E-O）效应具备电光调谐功能。在1530 - 1620 nm范围内，该交织器实现了55 GHz的信道间隔和12 - 28 dB的消光比。由于硅的折射率较大，基于Si-LNOI的硅负载条形波导具有紧凑的光学模式面积，这使得电极间隙较小，从而提高了交织器的电光调制效率。对于1 mm的电光相互作用长度，电光调制效率为26 pm/V。该交织器在DWDM系统、光开关和滤波器中具有潜在应用。
