Sal'nikov K V
Tsitologiia. 1986 Jun;28(6):615-22.
Stable mutants resistant to ethidium bromide in concentrations of 1 and 3 micrograms/ml have been selected in a single step in L cells. The frequency of spontaneously occurring ethidium bromide resistant clones after the exposure to 1 microgram/ml of the drug has been established as 5.10(-5). Resistant variants were induced following treatment with mutagen N-methyl-N-nitro-N-nitrosoguanidine. The resistant clones were shown to be resistant to higher concentration of the agent then which was used for selection. In multistep selection, a number of clones resistant to ethidium bromide in concentration up to 50 micrograms/ml was obtained. The alteration in the permeability of plasma membrane to the drug is the clue mechanism of the resistance.
已在L细胞中一步筛选出对浓度为1微克/毫升和3微克/毫升溴化乙锭具有抗性的稳定突变体。暴露于1微克/毫升该药物后,自发出现的溴化乙锭抗性克隆的频率已确定为5×10⁻⁵。用诱变剂N-甲基-N-硝基-N-亚硝基胍处理后诱导出抗性变体。结果表明,抗性克隆对高于用于筛选的药物浓度具有抗性。在多步筛选中,获得了许多对浓度高达50微克/毫升溴化乙锭具有抗性的克隆。质膜对药物通透性的改变是抗性的关键机制。