Yang Kaiyu, Zheng Jinping, Mao Jinliang, Zhao Haobing, Ju Songman, Zhang QingKai, Lin Zhihan, Yu Yongshen, Li Fushan
College of Physics and Information Engineering, Fuzhou University, Fuzhou 350108, People's Republic of China.
Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350108, People's Republic of China.
ACS Appl Mater Interfaces. 2023 Aug 23;15(33):40062-40069. doi: 10.1021/acsami.3c07302. Epub 2023 Aug 8.
Perovskite quantum dot light-emitting diodes (QLEDs) with high color purity and wide color gamut have good application prospects in the next generation of display technology. However, colloidal perovskite quantum dots (PQDs) may introduce a large number of defects during the film-forming process, which is not conducive to the luminous efficiency of the device. Meanwhile, the disordered film formation of PQDs will form interfacial defects and reduce the device performance. Here, we report an interface-induced crystallinity enhancement (IICE) strategy to increase the crystallinity of PQDs at the hole transport layer (HTL)/PQD interface. As a result, both the Br vacancies in the PQD film and the interfacial defects were well passivated and the leakage current was also suppressed. We achieved QLEDs with a maximum external quantum efficiency (EQE) of 16.45% and current efficiency (CE) of 61.77 cd/A, showing improved performance to more than twice that of the control devices. The IICE strategy paves a new way to enhance the crystallinity of PQD films, so as to improve the performance of QLEDs for application in the future display field.
具有高色纯度和宽色域的钙钛矿量子点发光二极管(QLED)在下一代显示技术中具有良好的应用前景。然而,胶体钙钛矿量子点(PQD)在成膜过程中可能会引入大量缺陷,这不利于器件的发光效率。同时,PQD的无序成膜会形成界面缺陷并降低器件性能。在此,我们报道了一种界面诱导结晶度增强(IICE)策略,以提高空穴传输层(HTL)/PQD界面处PQD的结晶度。结果,PQD薄膜中的Br空位和界面缺陷均得到了良好的钝化,漏电流也得到了抑制。我们实现了最大外量子效率(EQE)为16.45%、电流效率(CE)为61.77 cd/A的QLED,其性能提升至对照器件的两倍以上。IICE策略为提高PQD薄膜的结晶度开辟了一条新途径,从而改善QLED的性能,以应用于未来的显示领域。