Niu Zhiyuan, Li Sikun, Liu Yang
Appl Opt. 2023 Jun 20;62(18):4759-4765. doi: 10.1364/AO.489083.
Double-Ronchi shearing interferometry is widely used in wavefront aberration measurements for advanced lithography projection lens systems. A rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools is the precondition for phase-shifting retrieval algorithm design and error analysis. This paper presents a rigorous simulation model of double-Ronchi shearing interferometry considering the vector nature of light. The model is accurate and can be used in the study of double-Ronchi shearing interferometry.
双 Ronchi 剪切干涉测量法广泛应用于先进光刻投影透镜系统的波前像差测量。光刻工具上双 Ronchi 剪切干涉测量法的严格仿真模型是相移检索算法设计和误差分析的前提条件。本文提出了一种考虑光的矢量特性的双 Ronchi 剪切干涉测量法的严格仿真模型。该模型准确无误，可用于双 Ronchi 剪切干涉测量法的研究。
