Kolari P J, Hoikkala M, Lauharanta J
Photodermatol. 1986 Aug;3(4):228-32.
The dose response and accuracy of polysulphone film badges for monitoring UVB radiation (280-315 nm) were assessed by spectroradiometric measurements of the radiation source. A new formula is presented to calculate the UVB exposure of film badges. It is based on absorbance change at 330 nm and takes into account the saturation of the optical density of the badges. A good correlation was found between measured and radiated dose. Differences from previous formulae and limitations of the polysulphone films are discussed.
通过对辐射源的光谱辐射测量，评估了用于监测中波紫外线辐射（280 - 315纳米）的聚砜薄膜徽章的剂量响应和准确性。提出了一种新的公式来计算薄膜徽章的中波紫外线暴露量。该公式基于330纳米处的吸光度变化，并考虑了徽章光密度的饱和情况。测量剂量与辐射剂量之间存在良好的相关性。讨论了与先前公式的差异以及聚砜薄膜的局限性。
