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使用高功率脉冲磁控溅射和直流磁控溅射制备的CrN涂层的比较。

Comparison of CrN Coatings Prepared Using High-Power Impulse Magnetron Sputtering and Direct Current Magnetron Sputtering.

作者信息

Bai Heda, Li Jin, Gao Jialai, Ni Jinyang, Bai Yaxiong, Jian Jie, Zhao Lin, Bai Bowen, Cai Zeyun, He Jianchao, Chen Hongsheng, Leng Xuesong, Liu Xiangli

机构信息

School of Materials Science and Engineering, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, China.

Institute of Special Environments Physical Sciences, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, China.

出版信息

Materials (Basel). 2023 Sep 20;16(18):6303. doi: 10.3390/ma16186303.

DOI:10.3390/ma16186303
PMID:37763579
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10532976/
Abstract

Chromium Nitride (CrN) coatings have widespread utilization across numerous industrial applications, primarily attributed to their excellent properties. Among the different methods for CrN coating synthesis, direct current magnetron sputtering (DCMS) has been the dominant technique applied. Nonetheless, with the expanded applications of CrN coatings, the need for enhanced mechanical performance is concurrently escalating. High-power impulse magnetron sputtering (HiPIMS), an innovative coating deposition approach developed over the past three decades, is gaining recognition for its capability of yielding coatings with superior mechanical attributes, thereby drawing significant research interest. Considering that the mechanical performance of a coating is fundamentally governed by its microstructural properties, a comprehensive review of CrN coatings fabricated through both techniques is presented. This review of recent literature aims to embark on an insightful comparison between DCMS and HiPIMS, followed by an examination of the microstructure of CrN coatings fabricated via both techniques. Furthermore, the exploration of the underlying factors contributing to the disparities in mechanical properties observed in CrN coatings is revealed. An assessment of the advantages and potential shortcomings of HiPIMS is discussed, offering insight into CrN coating fabrication.

摘要

氮化铬(CrN)涂层因其优异的性能而在众多工业应用中得到广泛应用。在CrN涂层合成的不同方法中,直流磁控溅射(DCMS)一直是应用的主导技术。然而,随着CrN涂层应用的扩大,对增强机械性能的需求也在同步增加。高功率脉冲磁控溅射(HiPIMS)是过去三十年中开发的一种创新涂层沉积方法,因其能够制备具有优异机械性能的涂层而受到认可,从而引起了广泛的研究兴趣。鉴于涂层的机械性能从根本上受其微观结构特性的支配,本文对通过这两种技术制备的CrN涂层进行了全面综述。本文对近期文献的综述旨在对DCMS和HiPIMS进行深入比较,然后研究通过这两种技术制备的CrN涂层的微观结构。此外,还揭示了导致CrN涂层机械性能差异的潜在因素。讨论了HiPIMS的优点和潜在缺点,为CrN涂层制备提供了见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b418/10532976/97582bd32938/materials-16-06303-g013.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b418/10532976/e216a515347f/materials-16-06303-g009.jpg
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