Chen Guan-Yu, Fu Ling-Ling, Ye Bin, Ao Man, Yan Ming, Feng Hong-Chao
College of Stomatology, Guizhou Medical University, Guiyang, China.
Department of Oral and Maxillofacial Surgery, Guiyang Hospital of Stomatology, Guiyang, China.
Front Psychiatry. 2023 Sep 13;14:1243044. doi: 10.3389/fpsyt.2023.1243044. eCollection 2023.
Several existing studies have shown a correlation between schizophrenia and lichen planus (LP). However, the causality of this relationship remains uncertain. Thus, this study aimed to examine the causal association between schizophrenia and LP.
A two-sample Mendelian randomization (MR) study was carried out to investigate whether schizophrenia is causally related to LP and vice versa, and genetic variants in this study were taken from previous genome-wide association studies. We used the inverse variance weighted (IVW) method as the main analysis. Furthermore, several sensitivity analyses were performed to assess heterogeneity, horizontal pleiotropy, and stability.
Our results show that schizophrenia has a protective effect on LP (OR = 0.881, 95%CI = 0.795-0.975, = 0.015). Conversely, we observed no significant relationship between LP and schizophrenia in reverse MR analysis (OR = 0.934, 95%CI = 0.851-1.026, = 0.156).
Our two-sample Mendelian randomization study supports a significant causal relationship between LP and schizophrenia and finds that schizophrenia can reduce the incidence of LP. This is in contrast to previous findings and provides new insights into the relationship between LP and schizophrenia, but the exact mechanism needs further investigation.
现有多项研究表明精神分裂症与扁平苔藓(LP)之间存在关联。然而,这种关系的因果性仍不确定。因此,本研究旨在探讨精神分裂症与LP之间的因果关联。
开展了一项两样本孟德尔随机化(MR)研究,以调查精神分裂症与LP是否存在因果关系,反之亦然,本研究中的基因变异取自先前的全基因组关联研究。我们采用逆方差加权(IVW)方法作为主要分析方法。此外,还进行了多项敏感性分析,以评估异质性、水平多效性和稳定性。
我们的结果表明,精神分裂症对LP有保护作用(OR = 0.881,95%CI = 0.795 - 0.975,P = 0.015)。相反,在反向MR分析中,我们未观察到LP与精神分裂症之间存在显著关系(OR = 0.934,95%CI = 0.851 - 1.026,P = 0.156)。
我们的两样本孟德尔随机化研究支持LP与精神分裂症之间存在显著的因果关系,并发现精神分裂症可降低LP的发病率。这与先前的研究结果相反,为LP与精神分裂症之间的关系提供了新的见解,但确切机制有待进一步研究。