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由台阶边缘触发的Cu(111)表面单层硼烯的形成

Monolayer Borophene Formation on Cu(111) Surface Triggered by Step Edge.

作者信息

Li Hao, Yang Jiangang, Ma Yaping, Liu Guowei, Xu Xin, Huo Zhe, Chen Junbo, Li Jing, Zhang Weifeng, Wang Kedong, Chen Lan, Xiao Xudong

机构信息

School of Physical Science and Technology and Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, Wuhan University, Wuhan, 430072, P. R. China.

School of Future Technology, Henan Key Laboratory of Photovoltaic Materials, Henan University, Zhengzhou, 450046, P. R. China.

出版信息

Small. 2024 Feb;20(7):e2303502. doi: 10.1002/smll.202303502. Epub 2023 Oct 15.

DOI:10.1002/smll.202303502
PMID:37840447
Abstract

Borophene, a promising material with potential applications in electronics, energy storage, and sensors, is successfully grown as a monolayer on Ag(111), Cu(111), and Au(111) surfaces using molecular beam epitaxy. The growth of two-dimensional borophene on Ag(111) and Au(111) is proposed to occur via surface adsorption and boron segregation, respectively. However, the growth mode of borophene on Cu(111) remains unclear. To elucidate this, scanning tunneling microscopy in conjunction with theoretical calculations is used to study the phase transformation of boron nanostructures under post-annealing treatments. Results show that by elevating the substrate temperature, boron nanostructures undergo an evolution from amorphous boron to striped-phase borophene (η = 1/6) adhering to the Cu step edge, and finally to irregularly shaped β-type borophene (η = 5/36) either on the substrate surface or embedded in the topmost Cu layer. dI/dV spectra recorded near the borophene/Cu lateral interfaces indicate that the striped-phase borophene is a metastable phase, requiring more buckling and electron transfer to stabilize the crystal structure. These findings offer not only an in-depth comprehension of the β-type borophene formation on Cu(111), but also hold potential for enabling borophene synthesis on weakly-binding semiconducting or insulating substrates with 1D active defects.

摘要

硼烯是一种在电子学、能量存储和传感器领域具有潜在应用前景的材料,利用分子束外延技术成功地在Ag(111)、Cu(111)和Au(111)表面生长出了单层硼烯。二维硼烯在Ag(111)和Au(111)上的生长分别被认为是通过表面吸附和硼偏析发生的。然而,硼烯在Cu(111)上的生长模式仍不清楚。为了阐明这一点,结合理论计算使用扫描隧道显微镜来研究后退火处理下硼纳米结构的相变。结果表明,通过提高衬底温度,硼纳米结构经历了从非晶硼到附着在Cu台阶边缘的条纹相硼烯(η = 1/6)的演化,最终在衬底表面或嵌入最顶层Cu层中形成不规则形状的β型硼烯(η = 5/36)。在硼烯/Cu横向界面附近记录的dI/dV光谱表明,条纹相硼烯是一种亚稳相,需要更多的屈曲和电子转移来稳定晶体结构。这些发现不仅提供了对Cu(111)上β型硼烯形成的深入理解,而且对于在具有一维活性缺陷的弱结合半导体或绝缘衬底上实现硼烯合成具有潜在意义。

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