Chon Seoungmin, Nakayama Ryo, Iwamoto Shunta, Kobayashi Shigeru, Shimizu Ryota, Hitosugi Taro
School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo 152-8552, Japan.
Department of Chemistry, The University of Tokyo, Tokyo 113-0033, Japan.
ACS Appl Mater Interfaces. 2023 Dec 6;15(48):56057-56063. doi: 10.1021/acsami.3c14401. Epub 2023 Nov 27.
Metal-organic frameworks (MOFs) are attractive materials with periodic pore structures constructed by coordinating metal ions and organic ligands. Recently, Cu(HHTP) (HHTP = 2,3,6,7,10,11-hexahydroxytriphenylene), a two-dimensional conductive MOF, has attracted attention as a promising device material. Owing to the anisotropy of Cu(HHTP) properties, oriented thin films of this MOF are desired for evaluating its physical properties and device integration. To date, wet processes have been used to fabricate Cu(HHTP) films, whereas dry processes are essential for high-quality devices. However, oriented Cu(HHTP) thin films have not yet been fabricated by using dry processes. In this study, we succeed in fabricating an orientation-controlled Cu(HHTP) film on AlO (001) by using a two-step dry process involving (1) the multilayer deposition of copper acetate and HHTP using a vapor deposition system and (2) pyridine vapor-assisted annealing. In-plane and out-of-plane X-ray diffraction patterns confirm the successful fabrication of the (001)-oriented Cu(HHTP) films. The conductivity evaluated by four-probe measurements is 2.6 × 10 S cm, comparable to that of films fabricated by wet processes. This study provides a novel guideline for the orientation control of two-dimensional conductive MOF thin films via a dry process.
金属有机框架(MOFs)是一类具有吸引力的材料,其具有通过金属离子与有机配体配位构建的周期性孔结构。最近,二维导电MOF——Cu(HHTP)(HHTP = 2,3,6,7,10,11 - 六羟基三亚苯)作为一种有前景的器件材料受到了关注。由于Cu(HHTP)性质的各向异性,需要这种MOF的取向薄膜来评估其物理性质和器件集成。迄今为止,湿法工艺已被用于制备Cu(HHTP)薄膜,而干法工艺对于高质量器件至关重要。然而,尚未通过干法工艺制备出取向的Cu(HHTP)薄膜。在本研究中,我们通过两步干法工艺成功地在AlO(001)上制备了取向可控的Cu(HHTP)薄膜,该工艺包括:(1)使用气相沉积系统对醋酸铜和HHTP进行多层沉积,以及(2)吡啶蒸汽辅助退火。面内和面外X射线衍射图谱证实了(001)取向的Cu(HHTP)薄膜的成功制备。通过四探针测量评估的电导率为2.6×10 S cm,与通过湿法工艺制备的薄膜相当。本研究为通过干法工艺对二维导电MOF薄膜进行取向控制提供了新的指导方针。