Matsui Fumihiko, Hagiwara Kenta, Nakamura Eiken, Yano Takayuki, Matsuda Hiroyuki, Okano Yasuaki, Kera Satoshi, Hashimoto Eri, Koh Shinji, Ueno Keiji, Kobayashi Takahiro, Iwamoto Emi, Sakamoto Kazuyuki, Tanaka Shin-Ichiro, Suga Shigemasa
UVSOR Synchrotron Facility, Institute for Molecular Science, Okazaki, Aichi 444-8585, Japan.
The Graduate University for Advanced Studies, SOKENDAI, Okazaki, Aichi 444-8585, Japan.
Rev Sci Instrum. 2023 Aug 1;94(8). doi: 10.1063/5.0154156.
The photoelectron momentum microscope (PMM) in operation at BL6U, an undulator-based soft x-ray beamline at the UVSOR Synchrotron Facility, offers a new approach for μm-scale momentum-resolved photoelectron spectroscopy (MRPES). A key feature of the PMM is that it can very effectively reduce radiation-induced damage by directly projecting a single photoelectron constant energy contour in reciprocal space with a radius of a few Å-1 or real space with a radius of a few 100 μm onto a two-dimensional detector. This approach was applied to three-dimensional valence band structure E(k) and E(r) measurements ("stereography") as functions of photon energy (hν), its polarization (e), detection position (r), and temperature (T). In this study, we described some examples of possible measurement techniques using a soft x-ray PMM. We successfully applied this stereography technique to μm-scale MRPES to selectively visualize the single-domain band structure of twinned face-centered-cubic Ir thin films grown on Al2O3(0001) substrates. The photon energy dependence of the photoelectron intensity on the Au(111) surface state was measured in detail within the bulk Fermi surface. By changing the temperature of 1T-TaS2, we clarified the variations in the valence band dispersion associated with chiral charge-density-wave phase transitions. Finally, PMMs for valence band stereography with various electron analyzers were compared, and the advantages of each were discussed.
运行于UVSOR同步辐射装置基于波荡器的软X射线束线BL6U的光电子动量显微镜(PMM),为微米尺度的动量分辨光电子能谱(MRPES)提供了一种新方法。PMM的一个关键特性是,它能够通过将倒易空间中半径为几Å-1或实空间中半径为几百微米的单个光电子恒定能量轮廓直接投影到二维探测器上,非常有效地减少辐射诱导损伤。这种方法被应用于三维价带结构E(k)和E(r)的测量(“立体成像”),作为光子能量(hν)、其偏振(e)、探测位置(r)和温度(T)的函数。在本研究中,我们描述了一些使用软X射线PMM的可能测量技术的示例。我们成功地将这种立体成像技术应用于微米尺度的MRPES,以选择性地可视化生长在Al2O3(0001)衬底上的孪晶面心立方Ir薄膜的单畴能带结构。在体费米面内详细测量了光电子强度对Au(111)表面态的光子能量依赖性。通过改变1T-TaS2的温度,我们阐明了与手性电荷密度波相变相关的价带色散变化。最后,比较了使用各种电子分析仪进行价带立体成像的PMM,并讨论了每种PMM的优点。