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全头皮照射:比较多种类型的敷贴器和 VMAT 优化技术的研究。

Total scalp irradiation: A study comparing multiple types of bolus and VMAT optimization techniques.

机构信息

Medical Dosimetry Program, Southern Illinois University, Carbondale, Illinois, USA.

Department of Radiation Oncology, Emory University, Atlanta, Georgia, USA.

出版信息

J Appl Clin Med Phys. 2024 Apr;25(4):e14260. doi: 10.1002/acm2.14260. Epub 2024 Jan 19.

Abstract

PURPOSE

To investigate bolus design and VMAT optimization settings for total scalp irradiation.

METHODS

Three silicone bolus designs (flat, hat, and custom) from .decimal were evaluated for adherence to five anthropomorphic head phantoms. Flat bolus was cut from a silicone sheet. Generic hat bolus resembles an elongated swim cap while custom bolus is manufactured by injecting silicone into a 3D printed mold. Bolus placement time was recorded. Air gaps between bolus and scalp were quantified on CT images. The dosimetric effect of air gaps on target coverage was evaluated in a treatment planning study where the scalp was planned to 60 Gy in 30 fractions. A noncoplanar VMAT technique based on gEUD penalties was investigated that explored the full range of gEUD alpha values to determine which settings achieve sufficient target coverage while minimizing brain dose. ANOVA and the t-test were used to evaluate statistically significant differences (threshold = 0.05).

RESULTS

The flat bolus took 32 ± 5.9 min to construct and place, which was significantly longer (p < 0.001) compared with 0.67 ± 0.2 min for the generic hat bolus or 0.53 ± 0.10 min for the custom bolus. The air gap volumes were 38 ± 9.3 cc, 32 ± 14 cc, and 17 ± 7.0 cc for the flat, hat, and custom boluses, respectively. While the air gap differences between the flat and custom boluses were significant (p = 0.011), there were no significant dosimetric differences in PTV coverage at V57Gy or V60Gy. In the VMAT optimization study, a gEUD alpha of 2 was found to minimize the mean brain dose.

CONCLUSIONS

Two challenging aspects of total scalp irradiation were investigated: bolus design and plan optimization. Results from this study show opportunities to shorten bolus fabrication time during simulation and create high quality treatment plans using a straightforward VMAT template with simple optimization settings.

摘要

目的

研究全头皮照射的推注设计和 VMAT 优化设置。

方法

评估了来自.decimal 的三种硅树脂推注设计(平、帽和定制),以适应五个人体头部模型。平垫是从硅酮片上切割下来的。普通的帽子垫类似于一个拉长的泳帽,而定制的垫是通过将硅酮注入 3D 打印模具中制造的。记录了放置时间。在 CT 图像上量化了推注和头皮之间的气隙。在一项头皮计划为 60Gy 的 30 次分割的治疗计划研究中,评估了气隙对靶区覆盖的剂量学影响。使用基于 gEUD 惩罚的非共面 VMAT 技术进行了研究,该技术探索了 gEUD alpha 值的全范围,以确定哪些设置在最小化脑剂量的同时实现足够的靶区覆盖。使用方差分析和 t 检验评估了统计学显著差异(阈值=0.05)。

结果

平垫的制作和放置时间为 32±5.9 分钟,与通用帽垫的 0.67±0.2 分钟或定制垫的 0.53±0.10 分钟相比,时间明显更长(p<0.001)。平垫、帽垫和定制垫的气隙体积分别为 38±9.3cc、32±14cc 和 17±7.0cc。平垫和定制垫之间的气隙差异具有统计学意义(p=0.011),但在 PTV 覆盖的 V57Gy 或 V60Gy 方面没有显著的剂量学差异。在 VMAT 优化研究中,发现 gEUD alpha 为 2 可以最小化平均脑剂量。

结论

本研究调查了全头皮照射的两个具有挑战性的方面:推注设计和计划优化。本研究的结果表明,在模拟过程中可以缩短推注制作时间,并使用简单的 VMAT 模板和简单的优化设置创建高质量的治疗计划。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/af43/11005987/0fcc10804ebe/ACM2-25-e14260-g007.jpg

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