Huang Yinan, Wu Kunjie, Sun Yajing, Hu Yongxu, Wang Zhongwu, Yuan Liqian, Wang Shuguang, Ji Deyang, Zhang Xiaotao, Dong Huanli, Gong Zhongmiao, Li Zhiyun, Weng Xuefei, Huang Rong, Cui Yi, Chen Xiaosong, Li Liqiang, Hu Wenping
Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Fuzhou, Fujian, 350207, China.
Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Department of Chemistry, Institute of Molecular Aggregation Science, School of Science, Tianjin University, Tianjin, 300072, China.
Nat Commun. 2024 Jan 20;15(1):626. doi: 10.1038/s41467-024-44897-w.
Optoelectronic properties of semiconductors are significantly modified by impurities at trace level. Oxygen, a prevalent impurity in organic semiconductors (OSCs), has long been considered charge-carrier traps, leading to mobility degradation and stability problems. However, this understanding relies on the conventional deoxygenation methods, by which oxygen residues in OSCs are inevitable. It implies that the current understanding is questionable. Here, we develop a non-destructive deoxygenation method (i.e., de-doping) for OSCs by a soft plasma treatment, and thus reveal that trace oxygen significantly pre-empties the donor-like traps in OSCs, which is the origin of p-type characteristics exhibited by the majority of these materials. This insight is completely opposite to the previously reported carrier trapping and can clarify some previously unexplained organic electronics phenomena. Furthermore, the de-doping results in the disappearance of p-type behaviors and significant increase of n-type properties, while re-doping (under light irradiation in O) can controllably reverse the process. Benefiting from this, the key electronic characteristics (e.g., polarity, conductivity, threshold voltage, and mobility) can be precisely modulated in a nondestructive way, expanding the explorable property space for all known OSC materials.
痕量杂质会显著改变半导体的光电特性。氧是有机半导体(OSC)中普遍存在的杂质,长期以来一直被认为是电荷载流子陷阱,会导致迁移率下降和稳定性问题。然而,这种认识依赖于传统的脱氧方法,采用这些方法时,OSC中的氧残留是不可避免的。这意味着目前的认识值得怀疑。在此,我们通过软等离子体处理开发了一种用于OSC的无损脱氧方法(即去掺杂),从而揭示痕量氧显著预先占据了OSC中类施主陷阱,这是这些材料中大多数呈现p型特性的根源。这一见解与先前报道的载流子俘获完全相反,并且可以澄清一些先前无法解释的有机电子现象。此外,去掺杂导致p型行为消失和n型特性显著增加,而重新掺杂(在氧气中光照下)可以可控地逆转这一过程。受益于此,关键电子特性(如极性、电导率、阈值电压和迁移率)可以以无损方式精确调制,扩展了所有已知OSC材料的可探索特性空间。