Laukkanen Pekka, Punkkinen Marko, Kuzmin Mikhail, Kokko Kalevi, Liu Xiaolong, Radfar Behrad, Vähänissi Ville, Savin Hele, Tukiainen Antti, Hakkarainen Teemu, Viheriälä Jukka, Guina Mircea
Department of Physics and Astronomy, University of Turku, Turku, Finland.
Department of Electronics and Nanoengineering, Aalto University, Espoo, Finland.
Rep Prog Phys. 2024 Mar 6;87(4). doi: 10.1088/1361-6633/ad2ac9.
Use and performance criteria of photonic devices increase in various application areas such as information and communication, lighting, and photovoltaics. In many current and future photonic devices, surfaces of a semiconductor crystal are a weak part causing significant photo-electric losses and malfunctions in applications. These surface challenges, many of which arise from material defects at semiconductor surfaces, include signal attenuation in waveguides, light absorption in light emitting diodes, non-radiative recombination of carriers in solar cells, leakage (dark) current of photodiodes, and light reflection at solar cell interfaces for instance. To reduce harmful surface effects, the optical and electrical passivation of devices has been developed for several decades, especially with the methods of semiconductor technology. Because atomic scale control and knowledge of surface-related phenomena have become relevant to increase the performance of different devices, it might be useful to enhance the bridging of surface physics to photonics. Toward that target, we review some evolving research subjects with open questions and possible solutions, which hopefully provide example connecting points between photonic device passivation and surface physics. One question is related to the properties of the wet chemically cleaned semiconductor surfaces which are typically utilized in device manufacturing processes, but which appear to be different from crystalline surfaces studied in ultrahigh vacuum by physicists. In devices, a defective semiconductor surface often lies at an embedded interface formed by a thin metal or insulator film grown on the semiconductor crystal, which makes the measurements of its atomic and electronic structures difficult. To understand these interface properties, it is essential to combine quantum mechanical simulation methods. This review also covers metal-semiconductor interfaces which are included in most photonic devices to transmit electric carriers to the semiconductor structure. Low-resistive and passivated contacts with an ultrathin tunneling barrier are an emergent solution to control electrical losses in photonic devices.
光子器件的使用和性能标准在信息与通信、照明及光伏等各个应用领域都有所提高。在许多当前和未来的光子器件中,半导体晶体的表面是一个薄弱环节,会在应用中导致显著的光电损耗和故障。这些表面挑战,其中许多源于半导体表面的材料缺陷,包括例如波导中的信号衰减、发光二极管中的光吸收、太阳能电池中载流子的非辐射复合、光电二极管的泄漏(暗)电流以及太阳能电池界面处的光反射。为了减少有害的表面效应,器件的光学和电学钝化已经发展了几十年,尤其是采用半导体技术的方法。由于原子尺度控制和与表面相关现象的知识对于提高不同器件的性能变得至关重要,增强表面物理与光子学之间的联系可能会很有用。朝着这个目标,我们回顾一些有开放性问题和可能解决方案的不断发展的研究课题,希望能提供光子器件钝化与表面物理之间的示例连接点。一个问题与湿法化学清洗的半导体表面的性质有关,这些表面通常用于器件制造过程,但似乎与物理学家在超高真空下研究的晶体表面不同。在器件中,有缺陷的半导体表面通常位于由生长在半导体晶体上的薄金属或绝缘膜形成的嵌入界面处,这使得对其原子和电子结构的测量变得困难。为了理解这些界面性质,结合量子力学模拟方法至关重要。本综述还涵盖了大多数光子器件中包含的金属 - 半导体界面,用于将电载流子传输到半导体结构。具有超薄隧穿势垒的低电阻和钝化接触是控制光子器件电损耗的一种新兴解决方案。