Pei Chengjie, Zhang Jindong, Li Hai
Key Laboratory of Flexible Electronics (KLOFE), Institute of Advanced Materials (IAM), Nanjing Tech University (NanjingTech), 30 South Puzhu Road, Nanjing 211816, China.
Nanomaterials (Basel). 2024 Feb 9;14(4):339. doi: 10.3390/nano14040339.
As one of the key features of two-dimensional (2D) layered materials, stacking order has been found to play an important role in modulating the interlayer interactions of 2D materials, potentially affecting their electronic and other properties as a consequence. In this work, ultralow-frequency (ULF) Raman spectroscopy, electrostatic force microscopy (EFM), and high-resolution atomic force microscopy (HR-AFM) were used to systematically study the effect of stacking order on the interlayer interactions as well as electrostatic screening of few-layer polymorphic molybdenum disulfide (MoS) and molybdenum diselenide (MoSe) nanosheets. The stacking order difference was first confirmed by measuring the ULF Raman spectrum of the nanosheets with polymorphic stacking domains. The atomic lattice arrangement revealed using HR-AFM also clearly showed a stacking order difference. In addition, EFM phase imaging clearly presented the distribution of the stacking domains in the mechanically exfoliated nanosheets, which could have arisen from electrostatic screening. The results indicate that EFM in combination with ULF Raman spectroscopy could be a simple, fast, and high-resolution method for probing the distribution of polymorphic stacking domains in 2D transition metal dichalcogenide materials. Our work might be promising for correlating the interlayer interactions of TMDC nanosheets with stacking order, a topic of great interest with regard to modulating their optoelectronic properties.
作为二维(2D)层状材料的关键特征之一,人们发现堆叠顺序在调节二维材料的层间相互作用中起着重要作用,其结果可能会影响材料的电学和其他性质。在这项工作中,利用超低频(ULF)拉曼光谱、静电力显微镜(EFM)和高分辨率原子力显微镜(HR-AFM)系统地研究了堆叠顺序对少层多晶型二硫化钼(MoS)和二硒化钼(MoSe)纳米片层间相互作用以及静电屏蔽的影响。首先通过测量具有多晶型堆叠域的纳米片的ULF拉曼光谱来确认堆叠顺序差异。利用HR-AFM揭示的原子晶格排列也清楚地显示出堆叠顺序差异。此外,EFM相成像清楚地呈现了机械剥离纳米片中堆叠域的分布,这可能是由静电屏蔽引起的。结果表明,EFM与ULF拉曼光谱相结合可能是一种探测二维过渡金属二硫属化物材料中多晶型堆叠域分布的简单、快速且高分辨率的方法。我们的工作对于将TMDC纳米片的层间相互作用与堆叠顺序相关联可能具有前景,这是一个在调节其光电性质方面备受关注的主题。