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用于忆阻器应用的瞬态N-石墨烯量子点/聚乙烯醇纳米复合薄膜。

Transient N-GQDs/PVA nanocomposite thin film for memristor application.

作者信息

Pisal Deshmukh Akshaya, Patil Kalyanee, Barve Kanchan, Bhave Tejashree

机构信息

Department of Applied Physics, Defence Institute of Advanced Technology, Deemed University, Girinagar, Pune, 411025, India.

Department of Physics and Centre for Energy Science, Indian Institute of Science Education and Research, Pune, Dr Homi Bhabha Road, Pune, 411008, India.

出版信息

Nanotechnology. 2024 Apr 9;35(26). doi: 10.1088/1361-6528/ad364b.

Abstract

In recent years quantum dot (QDs) based resistive switching devices(memristors) have gained a lot of attention. Here we report the resistive switching behavior of nitrogen-doped graphene quantum dots/Polyvinyl alcohol (N-GQDs/PVA) degradable nanocomposite thin film with different weight percentages (wt.%) of N-GQDs. The memristor device was fabricated by a simple spin coating technique. It was found that 1 wt% N-GQDs/PVA device shows a prominent resistive switching phenomenon with good cyclic stability, high on/off ratio of ~10and retention time of ∼10s. From a detailed experimental study of band structure, we conclude that memristive behavior originates from the space charge controlled conduction (SCLC) mechanism. Further transient property of built memristive device was studied. Within three minutes of being submerged in distilled water, the fabricated memory device was destroyed. This phenomenon facilitates the usage of fabricated memristor devices to develop memory devices for military and security purposes.

摘要

近年来,基于量子点(QD)的电阻开关器件(忆阻器)备受关注。在此,我们报告了具有不同重量百分比(wt.%)氮掺杂石墨烯量子点/聚乙烯醇(N-GQDs/PVA)的可降解纳米复合薄膜的电阻开关行为。忆阻器器件通过简单的旋涂技术制备。结果发现,1 wt% N-GQDs/PVA器件表现出显著的电阻开关现象,具有良好的循环稳定性、约10的高开/关比和约10秒的保持时间。通过对能带结构的详细实验研究,我们得出忆阻行为源于空间电荷控制传导(SCLC)机制。进一步研究了所构建忆阻器件的瞬态特性。在浸入蒸馏水三分钟内,所制备的存储器件被破坏。这一现象有助于将所制备的忆阻器器件用于开发军事和安全用途的存储器件。

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