Sheng Meng-Wei, Hao You-Zeng, Wang Wei, Dong Zhong, Yang Yue-De, Xiao Jin-Long, Huang Yong-Zhen
Opt Express. 2024 Mar 25;32(7):12012-12023. doi: 10.1364/OE.514686.
We demonstrated a narrow linewidth semiconductor laser based on a deep-etched sidewall grating active distributed Bragg reflector (SG-ADBR). The coupling coefficients and reflectance were numerically simulated for deep-etched fifth-order SG-ADBR, and a reflectance of 0.86 with a bandwidth of 1.04 nm was obtained by the finite element method for a 500-period SG-ADBR. Then the fifth-order SG-ADBR lasers were fabricated using projection i-line lithography processes. Single-mode lasing at 1537.9 nm was obtained with a high side-mode suppression ratio (SMSR) of 65 dB, and a continuous tuning range of 10.3 nm was verified with SMSRs greater than 53 dB. Furthermore, the frequency noise power spectral density was characterized, from which a Lorentzian linewidth of 288 kHz was obtained.
我们展示了一种基于深蚀刻侧壁光栅有源分布布拉格反射器(SG-ADBR)的窄线宽半导体激光器。对深蚀刻的五阶SG-ADBR的耦合系数和反射率进行了数值模拟,通过有限元方法对500周期的SG-ADBR获得了反射率为0.86且带宽为1.04 nm的结果。然后使用投影i线光刻工艺制造了五阶SG-ADBR激光器。在1537.9 nm处实现了单模激射,其具有65 dB的高边模抑制比(SMSR),并且验证了在SMSR大于53 dB时连续调谐范围为10.3 nm。此外,对频率噪声功率谱密度进行了表征,从中获得了288 kHz的洛伦兹线宽。