Frustrated Lewis pairs created by Ce-doped BiMoO: A universal strategy to promote efficient utilization of HO for Fenton-like photodegradation.

Photo-Fenton-like technology based on HO is considered as an ideal strategy to generate reactive oxygen species (ROS) for antibiotic degradation, but O overflow in the process severely limits the utilization efficiency of HO. Herein, we fabricate BiMoO (BMO) photocatalyst modified with Frustrated Lewis pairs (FLPs) as a Fenton catalyst model for enhancing reuse of spilled O. The FLPs created by the introduction of cerium and oxygen vacancy were found to contribute to regulate the electronic structure of BMO and further improve the acidic and basic properties of photocatalyst surface. More importantly, the frustrated acid and base sites can enhance the HO and O interfacial adsorption process and provide an Ce-O-O active site on the surface of Ce-BMO nanosheets, which can promote O/•O/O/HO redox cycles to achieve high HO utilization efficiency. Specifically, in the experiment using tetracycline as a photocatalytic degradation object, the degradation activity of Ce-BMO was 2.15 times higher than that of BMO pure phase. Quenching experiments and EPR assays also confirmed that O and •O were the dominant oxidative species. This study systematically reveals the design of Fenton photocatalytic active sites at the atomic scale and provides new insights into constructing FLPs photocatalysts with high HO utilization efficiency.