Stendahl Sjoerd, Ghafoor Naureen, Schwartzkopf Matthias, Zubayer Anton, Birch Jens, Eriksson Fredrik
Department of Physics, Chemistry, and Biology, IFM, Linköping University, SE-581 83 Linköping, Sweden.
Deutsches Elektronen-Synchrotron DESY, Hamburg 22607, Germany.
ACS Appl Mater Interfaces. 2024 May 1;16(17):22665-22675. doi: 10.1021/acsami.4c01457. Epub 2024 Apr 22.
Multilayer neutron optics require precise control of interface morphology for optimal performance. In this work, we investigate the effects of different growth conditions on the interface morphology of Ni/Ti-based multilayers, with a focus on incorporating low-neutron-absorbing BC and using different ion assistance schemes. Grazing-incidence small-angle X-ray scattering was used to probe the structural and morphological details of buried interfaces, revealing that the layers become more strongly correlated and the interfaces form mounds with increasing amounts of BC. Applying high flux ion assistance during growth can reduce mound formation but lead to interface mixing, while a high flux modulated ion assistance scheme with an initial buffer layer grown at low ion energy and the top layer at higher ion energy prevents intermixing. The optimal condition was found to be adding 26.0 atom % BC combined with high flux modulated ion assistance. A multilayer with a period of 48.2 Å and 100 periods was grown under these conditions, and coupled fitting to neutron and X-ray reflectivity data revealed an average interface width of only 2.7 Å, a significant improvement over the current state-of-the-art commercial Ni/Ti multilayers. Overall, our study demonstrates that the addition of BC and the use of high flux modulated ion assistance during growth can significantly improve the interface morphology of Ni/Ti multilayers, leading to improved neutron optics performance.
多层中子光学器件需要精确控制界面形态以实现最佳性能。在这项工作中,我们研究了不同生长条件对镍/钛基多层膜界面形态的影响,重点是掺入低中子吸收性的硼碳化物(BC)并采用不同的离子辅助方案。掠入射小角X射线散射用于探测埋藏界面的结构和形态细节,结果表明随着BC含量的增加,各层之间的相关性增强,界面形成了丘状结构。在生长过程中施加高通量离子辅助可以减少丘状结构的形成,但会导致界面混合,而一种高通量调制离子辅助方案,即初始缓冲层在低离子能量下生长,顶层在较高离子能量下生长,可以防止混合。发现最佳条件是添加26.0原子%的BC并结合高通量调制离子辅助。在这些条件下生长了周期为48.2 Å且有100个周期的多层膜,对中子和X射线反射率数据进行联合拟合后发现平均界面宽度仅为2.7 Å,相较于当前最先进的商用镍/钛多层膜有显著改善。总体而言,我们的研究表明,在生长过程中添加BC并使用高通量调制离子辅助可以显著改善镍/钛多层膜的界面形态,从而提高中子光学性能。