Surface Chemistry of a [CCIm][OTf] (Sub)Wetting Layer on Pt(111): A Combined XPS, IRAS, and STM Study.

The concept of a solid catalyst with an ionic liquid layer (SCILL) is a promising approach to improve the selectivity of noble metal catalysts in heterogeneous reactions. In order to understand the origins of this selectivity control, we investigated the growth and thermal stability of ultrathin 1-ethyl-3-methylimidazolium trifluormethanesulfonate [CCIm][OTf] films on Pt(111) by infrared reflection absorption spectroscopy (IRAS) and X-ray photoelectron spectroscopy (XPS) in time-resolved and temperature-programmed experiments. We combined these spectroscopy experiments with scanning tunneling microscopy (STM) to obtain detailed insights into the orientation and adsorption geometry of the ions in the first IL layer. Furthermore, we propose a mechanism for the thermal evolution of [CCIm][OTf] on Pt(111). We observe an intact IL layer on the surface at temperatures below 200 K. Adsorbed [CCIm][OTf] forms islands, which are evenly distributed over the surface. The [OTf] anion adsorbs via the SO group, with the molecular axis perpendicular to the surface. Anions and cations are arranged next to each other, alternating on the Pt(111) surface. Upon heating to 250 K, we observe changes in geometry and structural distribution. Whereas at low temperature, the ions are arranged alternately for electrostatic reasons, this driving force is no longer decisive at 250 K. Here, a phase separation of two different species is discernible in STM. We propose that this effect is due to a surface reaction, which changes the charge of the adsorbates. We assume that the IL starts to decompose at around 250 K, and thus, pristine IL and decomposition products coexist on the surface. Also, IRAS and XPS show indication of IL decomposition. Further heating leads to increased IL decomposition. The reaction products associated with the anions are volatile and leave the surface. In contrast, the cation fragments remain on the surface up to temperatures above 420 K.