Wang Na, Zhang Guozhao, Wang Guangyu, Feng Zhenbao, Li Qian, Zhang Haiwa, Li Yinwei, Liu Cailong
School of Physical Science & Information Technology, Liaocheng University, Liaocheng, 252059, China.
Laboratory of Quantum Functional Materials Design and Application of Physics and Electronic Engineering, Jiangsu Normal University, Xuzhou, 221116, China.
Small. 2024 Aug;20(35):e2400216. doi: 10.1002/smll.202400216. Epub 2024 Apr 26.
Transition metal dichalcogenides (TMDs) exhibit excellent electronic and photoelectric properties under pressure, prompting researchers to investigate their structural phase transitions, electrical transport, and photoelectric response upon compression. Herein, the structural and photoelectric properties of layered ZrS under pressure using in situ high-pressure photocurrent, Raman scattering spectroscopy, alternating current impedance spectroscopy, absorption spectroscopy, and theoretical calculations are studied. The experimental results show that the photocurrent of ZrS continuously increases with increasing pressure. At 24.6 GPa, the photocurrent of high-pressure phase P2/m is three orders of magnitude greater than that of the initial phase at ambient pressure. The minimum synthesis pressure for pure high-pressure phase P2/m of ZrS is 18.8 GPa, which exhibits a photocurrent that is two orders of magnitude higher than that of the initial phase and displays excellent stability. Additionally, it is discovered that the crystal structure, electrical transport properties and bandgap of layered ZrS can also be regulated by pressure. This work offers researchers a new direction for synthesizing high-performance TMDs photoelectric materials using high pressure, which is crucial for enhancing the performance of photoelectric devices in the future.
过渡金属二硫属化物(TMDs)在压力下表现出优异的电学和光电性能,促使研究人员研究它们在压缩时的结构相变、电输运和光电响应。在此,利用原位高压光电流、拉曼散射光谱、交流阻抗谱、吸收光谱和理论计算研究了层状ZrS在压力下的结构和光电性能。实验结果表明,ZrS的光电流随压力增加而持续增加。在24.6 GPa时,高压相P2/m的光电流比常压下的初始相大三个数量级。ZrS纯高压相P2/m的最低合成压力为18.8 GPa,其光电流比初始相高两个数量级,并表现出优异的稳定性。此外,还发现层状ZrS的晶体结构、电输运性质和带隙也可以通过压力来调节。这项工作为研究人员提供了一个利用高压合成高性能TMDs光电材料的新方向,这对未来提高光电器件的性能至关重要。