Qi Zijun, Sun Xiang, Sun Zhanpeng, Wang Qijun, Zhang Dongliang, Liang Kang, Li Rui, Zou Diwei, Li Lijie, Wu Gai, Shen Wei, Liu Sheng
The Institute of Technological Sciences, Wuhan University, Wuhan 430072, China.
School of Power and Mechanical Engineering, Wuhan University, Wuhan 430072, China.
ACS Appl Mater Interfaces. 2024 May 29;16(21):27998-28007. doi: 10.1021/acsami.4c06055. Epub 2024 May 17.
AlN/diamond heterostructures hold tremendous promise for the development of next-generation high-power electronic devices due to their ultrawide band gaps and other exceptional properties. However, the poor adhesion at the AlN/diamond interface is a significant challenge that will lead to film delamination and device performance degradation. In this study, the uniaxial tensile failure of the AlN/diamond heterogeneous interfaces was investigated by molecular dynamics simulations based on a neuroevolutionary machine learning potential (NEP) model. The interatomic interactions can be successfully described by trained NEP, the reliability of which has been demonstrated by the prediction of the cleavage planes of AlN and diamond. It can be revealed that the annealing treatment can reduce the total potential energy by enhancing the binding of the C and N atoms at interfaces. The strain engineering of AlN also has an important impact on the mechanical properties of the interface. Furthermore, the influence of the surface roughness and interfacial nanostructures on the AlN/diamond heterostructures has been considered. It can be indicated that the combination of surface roughness reduction, AlN strain engineering, and annealing treatment can effectively result in superior and more stable interfacial mechanical properties, which can provide a promising solution to the optimization of mechanical properties, of ultrawide band gap semiconductor heterostructures.
由于具有超宽带隙和其他优异特性,AlN/金刚石异质结构在下一代高功率电子器件的发展中具有巨大潜力。然而,AlN/金刚石界面处较差的附着力是一个重大挑战,这将导致薄膜分层和器件性能下降。在本研究中,基于神经进化机器学习势(NEP)模型,通过分子动力学模拟研究了AlN/金刚石异质界面的单轴拉伸破坏。训练后的NEP能够成功描述原子间相互作用,其可靠性已通过对AlN和金刚石解理面的预测得到证明。结果表明,退火处理可以通过增强界面处C和N原子的结合来降低总势能。AlN的应变工程对界面的力学性能也有重要影响。此外,还考虑了表面粗糙度和界面纳米结构对AlN/金刚石异质结构的影响。结果表明,降低表面粗糙度、进行AlN应变工程和退火处理相结合,可以有效地产生优异且更稳定的界面力学性能,这可为优化超宽带隙半导体异质结构的力学性能提供一个有前景的解决方案。