Le Ha V, Vo Nhi T, Phan Hoan T, Dao Thu M, Nguyen Bao G, Nguyen Tung T, Ho Phuoc H, Nguyen Khoa D
Faculty of Chemical Engineering, Ho Chi Minh City University of Technology (HCMUT) 268 Ly Thuong Kiet Street, District 10 Ho Chi Minh City 70000 Vietnam
Vietnam National University Ho Chi Minh City Linh Trung Ward Ho Chi Minh City 70000 Vietnam.
RSC Adv. 2024 May 21;14(23):16389-16399. doi: 10.1039/d4ra02803a. eCollection 2024 May 15.
In this work, we introduce a novel defective analogue of the representative 6-connected zirconium-based metal-organic framework (MOF-808), by employing 5-sulfoisophthalic acid monosodium salt (HBTC-SONa) as a defect inducer a mixed-linker approach. The structural integrity and different physicochemical properties were investigated by various characterization techniques, including powder X-ray diffraction (PXRD), scanning electron microscopy (SEM), thermogravimetric analysis (TGA), and nitrogen physisorption at 77 K. Additionally, proton nuclear magnetic resonance (H-NMR), energy-dispersive X-ray (EDX), and inductively coupled plasma optical emission spectroscopy (ICP-OES) were employed to confirm the presence of 6.9 mol% of the 5-sulfoisophthalate ligand within the highly crystalline MOF-808 structure. The defective material exhibited significant enhancements in the removal efficiency of various organic dyes, including approximately 64% and 77% for quinoline yellow and sunset yellow, and 56% and 13% for rhodamine B and malachite green, compared to its pristine counterpart. Importantly, the defective MOF-808 showed a remarkable selectivity toward anionic species in binary-component dyes comprising both anionic and cationic dyes.
在本工作中,我们通过采用5-磺基间苯二甲酸单钠盐(HBTC-SONa)作为缺陷诱导剂,引入了一种具有代表性的6连接锆基金属有机框架(MOF-808)新型缺陷类似物。通过各种表征技术,包括粉末X射线衍射(PXRD)、扫描电子显微镜(SEM)、热重分析(TGA)以及77 K下的氮气物理吸附,研究了其结构完整性和不同的物理化学性质。此外,利用质子核磁共振(H-NMR)、能量色散X射线(EDX)和电感耦合等离子体发射光谱(ICP-OES)来确认在高度结晶的MOF-808结构中存在6.9 mol%的5-磺基间苯二甲酸酯配体。与原始材料相比,这种缺陷材料在去除各种有机染料方面表现出显著增强,喹啉黄和日落黄的去除率分别约为64%和77%,罗丹明B和孔雀石绿的去除率分别为56%和13%。重要的是,缺陷型MOF-808在包含阴离子和阳离子染料的二元组分染料中对阴离子物种表现出显著的选择性。