Zhou Yuqing, Li Shuang, Liang Xue, Zhou Yan
School of Science and Engineering, The Chinese University of Hong Kong, Shenzhen, Guangdong, 518172, China.
Adv Mater. 2025 Jan;37(2):e2312935. doi: 10.1002/adma.202312935. Epub 2024 Jul 1.
In the face of escalating modern data storage demands and the constraints of Moore's Law, exploring spintronic solutions, particularly the devices based on magnetic skyrmions, has emerged as a promising frontier in scientific research. Since the first experimental observation of skyrmions, topological spin textures have been extensively studied for their great potential as efficient information carriers in spintronic devices. However, significant challenges have emerged alongside this progress. This review aims to synthesize recent advances in skyrmion research while addressing the major issues encountered in the field. Additionally, current research on promising topological spin structures in addition to skyrmions is summarized. Beyond 2D structures, exploration also extends to 1D magnetic solitons and 3D spin textures. In addition, a diverse array of emerging magnetic materials is introduced, including antiferromagnets and 2D van der Waals magnets, broadening the scope of potential materials hosting topological spin textures. Through a systematic examination of magnetic principles, topological categorization, and the dynamics of spin textures, a comprehensive overview of experimental and theoretical advances in the research of topological magnetism is provided. Finally, both conventional and unconventional applications are summarized based on spin textures proposed thus far. This review provides an outlook on future development in applied spintronics.
面对不断增长的现代数据存储需求以及摩尔定律的限制,探索自旋电子学解决方案,特别是基于磁斯格明子的器件,已成为科学研究中一个充满前景的前沿领域。自首次实验观测到斯格明子以来,拓扑自旋纹理因其在自旋电子器件中作为高效信息载体的巨大潜力而受到广泛研究。然而,随着这一进展也出现了重大挑战。本综述旨在综合斯格明子研究的最新进展,同时解决该领域遇到的主要问题。此外,还总结了除斯格明子之外的有前景的拓扑自旋结构的当前研究。除了二维结构外,探索还扩展到一维磁孤子和三维自旋纹理。此外,还介绍了各种新兴磁性材料,包括反铁磁体和二维范德瓦尔斯磁体,拓宽了承载拓扑自旋纹理的潜在材料范围。通过对磁原理、拓扑分类和自旋纹理动力学的系统研究,提供了拓扑磁学研究中实验和理论进展的全面概述。最后,基于迄今为止提出的自旋纹理总结了传统和非传统应用。本综述展望了应用自旋电子学的未来发展。