Bi Rui-Xiang, Peng Zhi-Hai, Lei Lan, Wang Xiao-Xing, Liu Xin, Zhang Li, Liang Ru-Ping, Qiu Jian-Ding
School of Chemistry and Chemical Engineering, Nanchang University, Nanchang 330031, PR China.
School of Chemistry and Chemical Engineering, Nanchang University, Nanchang 330031, PR China.
J Hazard Mater. 2024 Aug 15;475:134869. doi: 10.1016/j.jhazmat.2024.134869. Epub 2024 Jun 9.
Photoreduction of highly toxic U(VI) to less toxic U(IV) is crucial for mitigating radioactive contamination. Herein, a CoWO/TpDD p-n heterojunction is synthesized, with TpDD serving as the n-type semiconductor substrate and CoWO as the p-type semiconductor grown in situ on its surface. The Fermi energy difference between TpDD and CoWO provides the electrochemical potential for charge-hole separation. Moreover, the Coulombic forces from the distinct carrier types between the two materials synergistically facilitate the transfer of electrons and holes. Hence, an internal electric field directed from TpDD to CoWO is established. Under photoexcitation conditions, charges and holes migrate efficiently along the curved band and internal electric field, further enhancing charge-hole separation. As a result, the removal capacity of CoWO/TpDD increases from 515.2 mg/g in the dark to 1754.6 mg/g under light conditions. Thus, constructing a p-n heterojunction proves to be an effective strategy for remediating uranium-contaminated environments.
将剧毒的U(VI)光还原为毒性较低的U(IV)对于减轻放射性污染至关重要。在此,合成了一种CoWO/TpDD p-n异质结,其中TpDD作为n型半导体基底,CoWO作为在其表面原位生长的p型半导体。TpDD和CoWO之间的费米能差为电荷-空穴分离提供了电化学势。此外,两种材料之间不同载流子类型产生的库仑力协同促进了电子和空穴的转移。因此,建立了一个从TpDD指向CoWO的内电场。在光激发条件下,电荷和空穴沿着弯曲的能带和内电场有效迁移,进一步增强了电荷-空穴分离。结果,CoWO/TpDD的去除能力从黑暗中的515.2 mg/g增加到光照条件下的1754.6 mg/g。因此,构建p-n异质结被证明是修复铀污染环境的有效策略。