Terpiłowski Konrad, Chodkowski Michał, Pakhlov Evgeniy, Pasieczna-Patkowska Sylwia, Kuśmierz Marcin, Azat Seitkhan, Pérez-Huertas Salvador
Department of Interfacial Phenomena, Institute of Chemical Sciences, Faculty of Chemistry, Maria Curie Skłodowska University, Maria Curie Skłodowska Sq. 2, 20-031 Lublin, Poland.
Department of Technology and Polymer Processing, Faculty of Mechanical Engineering, Lublin University of Technology, ul. Nadbystrzycka 36, 20-618 Lublin, Poland.
Molecules. 2024 Jun 4;29(11):2645. doi: 10.3390/molecules29112645.
The objective of this study was to investigate the modification of glass surfaces by the synergistic combination of cold plasma and chemical surface modification techniques. Glass surface hydrophobicity was obtained as a result of various plasma and deposition operational conditions. The mechanisms governing the hydrophobization process were also studied. Glass plates were activated with plasma using different gases (oxygen and argon) at different treatment times, ranging from 30 to 1800 s. Then, the plasma-treated surfaces were exposed to hexamethyldisilazane vapors at different temperatures, i.e., 25, 60, and 100 °C. Complete characterization, including contact angle measurements, surface free energy calculations, 3D profilometry, X-ray photoelectron spectroscopy, Fourier-transform infrared spectroscopy, and scanning electron microscopy, was accomplished. It was found that the extent of the hydrophobicity effect depends on both the plasma pre-treatment and the specific conditions of the hexamethyldisilazane deposition process. Plasma activation led to the formation of active sites on the glass surface, which promoted the adsorption and reaction of hexamethyldisilazane species, thereby inducing surface chemical modification. Longer plasma pre-treatment resulted in stronger modification on the glass surface, resulting in changes in the surface roughness. The largest water contact angle of ≈100° was obtained for the surface activated by argon plasma for 1800 s and exposed to hexamethyldisilazane vapors at 25 °C. The changes in the surface properties were caused by the introduction of the hydrophobic trimethylsilyl groups onto the glass surface as well as roughness development.
本研究的目的是研究冷等离子体与化学表面改性技术协同结合对玻璃表面的改性作用。由于各种等离子体和沉积操作条件，获得了玻璃表面的疏水性。还研究了疏水化过程的控制机制。使用不同气体（氧气和氩气）在30至1800秒的不同处理时间对玻璃板进行等离子体活化。然后，将经等离子体处理的表面在不同温度（即25、60和100℃）下暴露于六甲基二硅氮烷蒸气中。完成了包括接触角测量、表面自由能计算、三维轮廓测量、X射线光电子能谱、傅里叶变换红外光谱和扫描电子显微镜在内的全面表征。结果发现，疏水效应的程度取决于等离子体预处理和六甲基二硅氮烷沉积过程的特定条件。等离子体活化导致玻璃表面形成活性位点，促进了六甲基二硅氮烷物种的吸附和反应，从而引发表面化学改性。较长时间的等离子体预处理导致玻璃表面改性更强，导致表面粗糙度发生变化。对于经1800秒氩等离子体活化并在25℃下暴露于六甲基二硅氮烷蒸气的表面，获得了约100°的最大水接触角。表面性质的变化是由于玻璃表面引入了疏水性三甲基硅烷基以及粗糙度的发展所致。
