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非晶硅中带正电和中性氧空位的第一性原理研究

First-principles investigation of positively charged and neutral oxygen vacancies in amorphous silica.

作者信息

Wang Yuqi, Zhao Yaolin, Chen Zhongcun, Jia Ziqi, Tong Dayin, Nie Shaowei, Han Zitong

机构信息

School of Nuclear Science and Technology, Xi'an Jiaotong University, Xi'an 710049, People's Republic of China.

China Nuclear Power Technology Research Institute, Shenzhen 518000, People's Republic of China.

出版信息

J Chem Phys. 2024 Jul 21;161(3). doi: 10.1063/5.0206938.

Abstract

The structural parameters, electron localization functions, electron paramagnetic resonance (EPR) parameters, formation energies, and thermodynamic transition levels of various oxygen vacancy defects in amorphous silica are comprehensively and integrally investigated by using density functional theory. The trends of changes in the oxygen vacancy defect structure and electron localization induced by the increase in distance between defective silicon atoms are clearly identified. It is shown that the dimer configuration may be the potential structure of the Eδ' center. For the back-projected unpuckered configuration and the puckered configuration, whose EPR parameters are more consistent with the experimental values of the Eγ' center, the unpaired electron localized on the sp3 hybridized silicon atom is a common feature. Due to the three-coordinated oxygen atom in the forward-oriented configuration, the EPR parameters are closest to those of the Eα' center. Transformations of oxygen vacancy defects under different charge states are studied by sequentially adding and removing electrons. The thermodynamic transition level analysis reveals that the dimer and forward configurations may behave as deep traps for electron accumulation. The back-projected puckered fourfold-coordinated and fivefold-coordinated configurations are comparatively stable and may be able to function as shallow traps for electron transport. The neutral double unpuckered, neutral back-projected puckered fourfold-coordinated, and neutral back-projected unpuckered configurations are more likely to lose electrons during hole trapping. As the bias voltage is repeatedly changed, the defect density of the puckered configuration may reduce, while that of the dimer and unpuckered configuration may take an opposite trend.

摘要

采用密度泛函理论对非晶硅中各种氧空位缺陷的结构参数、电子局域函数、电子顺磁共振(EPR)参数、形成能和热力学跃迁能级进行了全面而综合的研究。明确了缺陷硅原子间距增加所引起的氧空位缺陷结构和电子局域变化趋势。结果表明,二聚体构型可能是Eδ'中心的潜在结构。对于反投影非褶皱构型和褶皱构型,其EPR参数与Eγ'中心的实验值更为一致,未成对电子定域在sp3杂化硅原子上是一个共同特征。由于前向构型中有三配位氧原子,其EPR参数最接近Eα'中心的参数。通过依次添加和移除电子研究了不同电荷状态下氧空位缺陷的转变。热力学跃迁能级分析表明,二聚体和前向构型可能表现为电子积累的深陷阱。反投影褶皱四重配位和五重配位构型相对稳定,可能能够作为电子传输的浅陷阱。中性双非褶皱、中性反投影褶皱四重配位和中性反投影非褶皱构型在空穴俘获过程中更有可能失去电子。随着偏置电压反复变化,褶皱构型的缺陷密度可能降低,而二聚体和非褶皱构型的缺陷密度可能呈相反趋势。

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