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双曲线介质中的深亚波长拓扑边缘态

Deep subwavelength topological edge state in a hyperbolic medium.

作者信息

Orsini Lorenzo, Herzig Sheinfux Hanan, Li Yandong, Lee Seojoo, Andolina Gian Marcello, Scarlatella Orazio, Ceccanti Matteo, Soundarapandian Karuppasamy, Janzen Eli, Edgar James H, Shvets Gennady, Koppens Frank H L

机构信息

ICFO - Institut de Ciencies Fotoniques, The Barcelona Institute of Science and Technology, Castelldefels, Spain.

Physics Department, Bar Ilan University, Ramat Gan, Israel.

出版信息

Nat Nanotechnol. 2024 Oct;19(10):1485-1490. doi: 10.1038/s41565-024-01737-8. Epub 2024 Aug 1.

Abstract

Topological photonics offers the opportunity to control light propagation in a way that is robust from fabrication disorders and imperfections. However, experimental demonstrations have remained on the order of the vacuum wavelength. Theoretical proposals have shown topological edge states that can propagate robustly while embracing deep subwavelength confinement that defies diffraction limits. Here we show the experimental proof of these deep subwavelength topological edge states by implementing periodic modulation of hyperbolic phonon polaritons within a van der Waals heterostructure composed of isotopically pure hexagonal boron nitride flakes on patterned gold films. The topological edge state is confined in a subdiffraction volume of 0.021 µm, which is four orders of magnitude smaller than the free-space excitation wavelength volume used to probe the system, while maintaining the resonance quality factor above 100. This finding can be directly extended to and hybridized with other van der Waals materials to broadened operational frequency ranges, streamline integration of diverse polaritonic materials, and compatibility with electronic and excitonic systems.

摘要

拓扑光子学提供了一种控制光传播的方法,这种方法对于制造缺陷和不完善具有鲁棒性。然而,实验演示仍停留在真空波长量级。理论研究表明,拓扑边缘态能够在突破衍射极限的深亚波长限制下稳健地传播。在这里,我们通过在由图案化金膜上的同位素纯六方氮化硼薄片组成的范德华异质结构中对双曲型声子极化激元进行周期性调制,展示了这些深亚波长拓扑边缘态的实验证据。拓扑边缘态被限制在0.021 µm的亚衍射体积内,这比用于探测该系统的自由空间激发波长体积小四个数量级,同时保持共振品质因数高于100。这一发现可以直接扩展到其他范德华材料并与之杂交,以拓宽工作频率范围,简化各种极化激元材料的集成,并与电子和激子系统兼容。

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