Tian Jing, Hou Sanying, Mao Lingjie, Xu Xin, Cao Humeizi, Duan Xinyi, Li Lingsisi, Zhou Zhiling, Ji Yaqiang, Xie Jin-Qi
School of Chemistry and Chemical Engineering, University of South China, Hengyang 421001, China.
School of Mechanical Engineering, Dongguan University of Technology, Dongguan 523808, China.
J Colloid Interface Sci. 2025 Jan;677(Pt B):130-139. doi: 10.1016/j.jcis.2024.08.068. Epub 2024 Aug 10.
Manufacturing of copper micro-patterns is crucial in electronics for its utilization as high conductivity transparent conductive films (TCFs) and circuits. In the preparation process of current TCFs, a plethora of materials have emerged that can replace traditional indium tin oxide (ITO). However, even for the most promising metal-based nanowire materials, there are issues such as high cost, complex welding, and high contact resistance. To address these problems, this paper proposes a printable and filament-drawable polydimethylsiloxane (PDMS)-based adhesive, which, through a novel additive patterning technology, efficiently and economically manufactures self-welding copper micro-meshes and circuits. The adhesive can be processed into micro-patterns through printing and filament drawing, on which ionic Ag can be in situ reduced and anchored, thereby eliminating the need for tedious pre- and post-treatment steps. The fully exposed Ag particles dramatically minimize the usage of precious metal catalyst, thus efficiently catalyzing electroless copper deposition (ECD) reaction. Highly conductive (1.03 × 10 S m) copper circuits can be fabricated on the printed adhesive patterns, exhibiting versatile applicability to diverse substrates. Highly precise copper micro-meshes (∼50 μm) can be fabricated on the filament networks drawn by the adhesive. The copper meshes undergo complete self-welding at junctions during the ECD process, thus exhibiting ultra-low square resistance of 0.45 Ω sq while maintaining a high transmittance of 82.2 %. This is far superior to most of TCFs in published literature.
铜微图案的制造在电子领域至关重要,因为它可被用作高导电性透明导电膜(TCF)和电路。在当前TCF的制备过程中,已经出现了大量可替代传统氧化铟锡(ITO)的材料。然而,即使是最有前景的金属基纳米线材料,也存在成本高、焊接复杂和接触电阻高等问题。为了解决这些问题,本文提出了一种基于可印刷和可拉丝的聚二甲基硅氧烷(PDMS)的粘合剂,该粘合剂通过一种新颖的添加剂图案化技术,高效且经济地制造自焊接铜微网和电路。这种粘合剂可通过印刷和拉丝加工成微图案,在其上离子银可原位还原并锚定,从而无需繁琐的预处理和后处理步骤。完全暴露的银颗粒极大地减少了贵金属催化剂的用量,从而有效地催化化学镀铜(ECD)反应。可以在印刷的粘合剂图案上制造高导电性(1.03×10 S m)的铜电路,对各种基板具有广泛的适用性。可以在由粘合剂绘制的细丝网络上制造高精度的铜微网(约50μm)。铜微网在ECD过程中在结点处完全自焊接,因此呈现出0.45Ω/sq的超低方阻,同时保持82.2%的高透过率。这远远优于已发表文献中的大多数TCF。