Energy-efficient resistive switching synaptic devices based on patterned Ag nanotriangles with tunable gaps fabricated using plasma-assisted nanosphere lithography.

The development of synaptic devices featuring metallic nanostructures with brain-analog hierarchical architecture, capable of mimicking cognitive functionalities, has emerged as a focal point in neuromorphic computing. However, existing challenges, such as inconsistent and unpredictable switching, high voltage requirements, unguided filament formation, and detailed fabrication processes, have impeded technological progress in the domain. The present study addresses some of these challenges by leveraging periodic nanostructures of Ag fabricated plasma-assisted nanosphere lithography (NSL). The triangular nanostructures with a preferred orientation offer enhanced localized electric fields, facilitating low voltage electromigration at the sharp edges to guide predictive filament formation. A thorough investigation into gap control between the nanostructures through oxygen plasma treatment enables the attainment of an optimized low switching voltage of 0.86 V and retention at an ultra-low current compliance of 100 nA. The optimized device consumes low power, typically in the fJ range, akin to biological neurons. Furthermore, the device showcases intriguing synaptic characteristics, including controlled transition from short- to long-term potentiation, associative learning, ., projecting its potential in perceptive learning, memory formation, and brain-inspired computing. COMSOL Multiphysics simulation, supported by electron microscopic imaging, confirms the controlled and predictable filament formation facilitated by electric field enhancement across the strategic nanostructures. Thus, the work highlights the potential of NSL-based cost-effective fabrication techniques for realizing efficient and biomimetic synaptic devices for neuromorphic computing applications.