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用于改善钙钛矿太阳能电池性能的TEOS改性:解决SnOETL的界面缺陷和电荷转移问题

TEOS modification for improved performance in perovskite solar cells: addressing the interface defects and charge transfer issues of SnOETL.

作者信息

Ebic Murat

机构信息

Karamanoglu Mehmetbey University, Institute of Science, Karaman, Turkey.

出版信息

Nanotechnology. 2024 Nov 5;36(4). doi: 10.1088/1361-6528/ad7e32.

Abstract

The remarkable advancements in performance and rapid progress of perovskite solar cells (PSCs) in recent years have captured the interest of the photovoltaics (PVs) community. Nevertheless, defects occurring at the interface between the electron transporting layer (ETL) and perovskite, along with issues related to charge transfer, significantly impede the PV efficiency of these cells. In this study, we investigated the impact of tetraethyl orthosilicate (TEOS) on charge transfer and defect states at the interface by incorporating varying concentrations of TEOS into the SnOETL and modifying the interface between the ETL and perovskite. This process can passivate the defects at the ETL/perovskite (Cs(FAMA)Pb(IBr)) interface and significantly extend the carrier lifetime. Moreover, TEOS modification plays a promising role in the growth kinetics of the perovskite films. As a result, a power conversion efficiency (PCE) of 20.0% was achieved with admissible phase stability in the presence of TEOS as dopant in SnOETL, while only 17.64% PCE was obtained for TEOS-free control structure. A promising PCE of 19.93% was achieved for ETL/TEOS/perovskite interface modification. This study presents a promising solution to address interface defects and charge transfer issues, which represent significant obstacles to the commercial scalability of PSCs.

摘要

近年来,钙钛矿太阳能电池(PSC)在性能上的显著进步和快速发展引起了光伏(PV)领域的关注。然而,电子传输层(ETL)与钙钛矿之间界面处出现的缺陷以及与电荷转移相关的问题,严重阻碍了这些电池的光伏效率。在本研究中,我们通过将不同浓度的正硅酸四乙酯(TEOS)掺入SnO ETL并修饰ETL与钙钛矿之间的界面,研究了TEOS对界面电荷转移和缺陷态的影响。这一过程可以钝化ETL/钙钛矿(Cs(FAMA)Pb(IBr))界面处的缺陷,并显著延长载流子寿命。此外,TEOS修饰在钙钛矿薄膜的生长动力学中发挥了有前景的作用。结果,在SnO ETL中使用TEOS作为掺杂剂时,实现了20.0%的功率转换效率(PCE),且具有可接受的相稳定性,而无TEOS的对照结构的PCE仅为17.64%。对于ETL/TEOS/钙钛矿界面修饰,实现了19.93%的有前景的PCE。本研究提出了一个有前景的解决方案,以解决界面缺陷和电荷转移问题,这些问题是PSC商业规模化的重大障碍。

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